Pulsed laser deposition chamber for in-situ X-ray diffraction

Vedran Vonk, Stan Konings, Laurent Barthe, Bernard Gorges, Heinz Graafsma

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    A sample chamber has been constructed for studying the growth of thin films by pulsed laser deposition in situ with surface X-ray diffraction. The achievable temperature ranges from room temperature to 1073 K in a controlled oxygen environment. The partial pressure of the oxygen background gas covers the range from 0.1 to 105 Pa. The first results, showing intensity oscillations in the diffracted signal during homoepitaxial deposition of SrTiO3, are presented.
    Original languageEnglish
    Pages (from-to)833-834
    Number of pages2
    JournalJournal of synchrotron radiation
    Publication statusPublished - 2005


    • Pulsed Laser Deposition (PLD)
    • Sample chamber


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