Pulsed laser deposition chamber for in-situ X-ray diffraction

Vedran Vonk; Stan Konings; Laurent Barthe; Bernard Gorges; Heinz Graafsma

doi:10.1107/S0909049505031547

Pulsed laser deposition chamber for in-situ X-ray diffraction

Vedran Vonk, Stan Konings, Laurent Barthe, Bernard Gorges, Heinz Graafsma

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Abstract

A sample chamber has been constructed for studying the growth of thin films by pulsed laser deposition in situ with surface X-ray diffraction. The achievable temperature ranges from room temperature to 1073 K in a controlled oxygen environment. The partial pressure of the oxygen background gas covers the range from 0.1 to 105 Pa. The first results, showing intensity oscillations in the diffracted signal during homoepitaxial deposition of SrTiO3, are presented.

Original language	English
Pages (from-to)	833-834
Number of pages	2
Journal	Journal of synchrotron radiation
Volume	12
DOIs	https://doi.org/10.1107/S0909049505031547
Publication status	Published - 2005

Keywords

Pulsed Laser Deposition (PLD)
Sample chamber

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10.1107/S0909049505031547

Vonk2005pulsedFinal published version, 263 KB

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title = "Pulsed laser deposition chamber for in-situ X-ray diffraction",

abstract = "A sample chamber has been constructed for studying the growth of thin films by pulsed laser deposition in situ with surface X-ray diffraction. The achievable temperature ranges from room temperature to 1073 K in a controlled oxygen environment. The partial pressure of the oxygen background gas covers the range from 0.1 to 105 Pa. The first results, showing intensity oscillations in the diffracted signal during homoepitaxial deposition of SrTiO3, are presented.",

keywords = "Pulsed Laser Deposition (PLD), Sample chamber",

author = "Vedran Vonk and Stan Konings and Laurent Barthe and Bernard Gorges and Heinz Graafsma",

year = "2005",

doi = "10.1107/S0909049505031547",

language = "English",

volume = "12",

pages = "833--834",

journal = "Journal of synchrotron radiation",

issn = "0909-0495",

publisher = "International Union of Crystallography",

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T1 - Pulsed laser deposition chamber for in-situ X-ray diffraction

AU - Vonk, Vedran

AU - Konings, Stan

AU - Barthe, Laurent

AU - Gorges, Bernard

AU - Graafsma, Heinz

PY - 2005

Y1 - 2005

N2 - A sample chamber has been constructed for studying the growth of thin films by pulsed laser deposition in situ with surface X-ray diffraction. The achievable temperature ranges from room temperature to 1073 K in a controlled oxygen environment. The partial pressure of the oxygen background gas covers the range from 0.1 to 105 Pa. The first results, showing intensity oscillations in the diffracted signal during homoepitaxial deposition of SrTiO3, are presented.

AB - A sample chamber has been constructed for studying the growth of thin films by pulsed laser deposition in situ with surface X-ray diffraction. The achievable temperature ranges from room temperature to 1073 K in a controlled oxygen environment. The partial pressure of the oxygen background gas covers the range from 0.1 to 105 Pa. The first results, showing intensity oscillations in the diffracted signal during homoepitaxial deposition of SrTiO3, are presented.

KW - Pulsed Laser Deposition (PLD)

KW - Sample chamber

U2 - 10.1107/S0909049505031547

DO - 10.1107/S0909049505031547

M3 - Article

VL - 12

SP - 833

EP - 834

JO - Journal of synchrotron radiation

JF - Journal of synchrotron radiation

SN - 0909-0495

ER -

Pulsed laser deposition chamber for in-situ X-ray diffraction

Abstract

Keywords

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