Pure-boron chemical-vapor-deposited layers: A new material for silicon device processing

L. K. Nanver, T. L.M. Scholtes, F. Sarubbi, W. B. De Boer, G. Lorito, A. Šakić, S. Milosavljević, C. Mok, L. Shi, S. Nihtianov, K. Buisman

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

15 Citations (Scopus)

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Engineering & Materials Science