Q-factor dependence of one-port encapsulated polysilicon resonator on reactive sealing pressure

C. Gui, R. Legtenberg, Rob Legtenberg, Michael Curt Elwenspoek, J.H.J. Fluitman

Research output: Contribution to journalArticleAcademicpeer-review

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Abstract

Micromachined encapsulated polysilicon resonators have been fabricated in different reactive sealing pressure, 200, 50 and 20 mTorr, in order to investigate the dependence of the Q-factors on the sealing pressure. Q-factors as high as 2700 have been measured. The experimental results show that the Q-factors of one-port encapsulated resonators are proportional to 1/p and the resonant frequency is independent of the sealing pressure. However, the measured Q-factors are more than two orders of magnitude lower than theoretical prediction.
Original languageEnglish
Pages (from-to)183-185
Number of pages3
JournalJournal of micromechanics and microengineering
Volume1995
Issue number5
DOIs
Publication statusPublished - Jun 1995

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Polysilicon
Resonators
Natural frequencies

Keywords

  • METIS-111578
  • IR-14384
  • EWI-13846

Cite this

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title = "Q-factor dependence of one-port encapsulated polysilicon resonator on reactive sealing pressure",
abstract = "Micromachined encapsulated polysilicon resonators have been fabricated in different reactive sealing pressure, 200, 50 and 20 mTorr, in order to investigate the dependence of the Q-factors on the sealing pressure. Q-factors as high as 2700 have been measured. The experimental results show that the Q-factors of one-port encapsulated resonators are proportional to 1/p and the resonant frequency is independent of the sealing pressure. However, the measured Q-factors are more than two orders of magnitude lower than theoretical prediction.",
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author = "C. Gui and R. Legtenberg and Rob Legtenberg and Elwenspoek, {Michael Curt} and J.H.J. Fluitman",
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Q-factor dependence of one-port encapsulated polysilicon resonator on reactive sealing pressure. / Gui, C.; Legtenberg, R.; Legtenberg, Rob; Elwenspoek, Michael Curt; Fluitman, J.H.J.

In: Journal of micromechanics and microengineering, Vol. 1995, No. 5, 06.1995, p. 183-185.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Q-factor dependence of one-port encapsulated polysilicon resonator on reactive sealing pressure

AU - Gui, C.

AU - Legtenberg, R.

AU - Legtenberg, Rob

AU - Elwenspoek, Michael Curt

AU - Fluitman, J.H.J.

PY - 1995/6

Y1 - 1995/6

N2 - Micromachined encapsulated polysilicon resonators have been fabricated in different reactive sealing pressure, 200, 50 and 20 mTorr, in order to investigate the dependence of the Q-factors on the sealing pressure. Q-factors as high as 2700 have been measured. The experimental results show that the Q-factors of one-port encapsulated resonators are proportional to 1/p and the resonant frequency is independent of the sealing pressure. However, the measured Q-factors are more than two orders of magnitude lower than theoretical prediction.

AB - Micromachined encapsulated polysilicon resonators have been fabricated in different reactive sealing pressure, 200, 50 and 20 mTorr, in order to investigate the dependence of the Q-factors on the sealing pressure. Q-factors as high as 2700 have been measured. The experimental results show that the Q-factors of one-port encapsulated resonators are proportional to 1/p and the resonant frequency is independent of the sealing pressure. However, the measured Q-factors are more than two orders of magnitude lower than theoretical prediction.

KW - METIS-111578

KW - IR-14384

KW - EWI-13846

U2 - 10.1088/0960-1317/5/2/034

DO - 10.1088/0960-1317/5/2/034

M3 - Article

VL - 1995

SP - 183

EP - 185

JO - Journal of micromechanics and microengineering

JF - Journal of micromechanics and microengineering

SN - 0960-1317

IS - 5

ER -