Q-factor dependence of one-port encapsulated polysilicon resonator on reactive sealing pressure

C. Gui, R. Legtenberg, Rob Legtenberg, Michael Curt Elwenspoek, J.H.J. Fluitman

    Research output: Contribution to journalArticleAcademicpeer-review

    12 Citations (Scopus)
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    Abstract

    Micromachined encapsulated polysilicon resonators have been fabricated in different reactive sealing pressure, 200, 50 and 20 mTorr, in order to investigate the dependence of the Q-factors on the sealing pressure. Q-factors as high as 2700 have been measured. The experimental results show that the Q-factors of one-port encapsulated resonators are proportional to 1/p and the resonant frequency is independent of the sealing pressure. However, the measured Q-factors are more than two orders of magnitude lower than theoretical prediction.
    Original languageEnglish
    Pages (from-to)183-185
    Number of pages3
    JournalJournal of micromechanics and microengineering
    Volume1995
    Issue number5
    DOIs
    Publication statusPublished - Jun 1995

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    Polysilicon
    Resonators
    Natural frequencies

    Keywords

    • METIS-111578
    • IR-14384
    • EWI-13846

    Cite this

    Gui, C. ; Legtenberg, R. ; Legtenberg, Rob ; Elwenspoek, Michael Curt ; Fluitman, J.H.J. / Q-factor dependence of one-port encapsulated polysilicon resonator on reactive sealing pressure. In: Journal of micromechanics and microengineering. 1995 ; Vol. 1995, No. 5. pp. 183-185.
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    abstract = "Micromachined encapsulated polysilicon resonators have been fabricated in different reactive sealing pressure, 200, 50 and 20 mTorr, in order to investigate the dependence of the Q-factors on the sealing pressure. Q-factors as high as 2700 have been measured. The experimental results show that the Q-factors of one-port encapsulated resonators are proportional to 1/p and the resonant frequency is independent of the sealing pressure. However, the measured Q-factors are more than two orders of magnitude lower than theoretical prediction.",
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    author = "C. Gui and R. Legtenberg and Rob Legtenberg and Elwenspoek, {Michael Curt} and J.H.J. Fluitman",
    year = "1995",
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    Q-factor dependence of one-port encapsulated polysilicon resonator on reactive sealing pressure. / Gui, C.; Legtenberg, R.; Legtenberg, Rob; Elwenspoek, Michael Curt; Fluitman, J.H.J.

    In: Journal of micromechanics and microengineering, Vol. 1995, No. 5, 06.1995, p. 183-185.

    Research output: Contribution to journalArticleAcademicpeer-review

    TY - JOUR

    T1 - Q-factor dependence of one-port encapsulated polysilicon resonator on reactive sealing pressure

    AU - Gui, C.

    AU - Legtenberg, R.

    AU - Legtenberg, Rob

    AU - Elwenspoek, Michael Curt

    AU - Fluitman, J.H.J.

    PY - 1995/6

    Y1 - 1995/6

    N2 - Micromachined encapsulated polysilicon resonators have been fabricated in different reactive sealing pressure, 200, 50 and 20 mTorr, in order to investigate the dependence of the Q-factors on the sealing pressure. Q-factors as high as 2700 have been measured. The experimental results show that the Q-factors of one-port encapsulated resonators are proportional to 1/p and the resonant frequency is independent of the sealing pressure. However, the measured Q-factors are more than two orders of magnitude lower than theoretical prediction.

    AB - Micromachined encapsulated polysilicon resonators have been fabricated in different reactive sealing pressure, 200, 50 and 20 mTorr, in order to investigate the dependence of the Q-factors on the sealing pressure. Q-factors as high as 2700 have been measured. The experimental results show that the Q-factors of one-port encapsulated resonators are proportional to 1/p and the resonant frequency is independent of the sealing pressure. However, the measured Q-factors are more than two orders of magnitude lower than theoretical prediction.

    KW - METIS-111578

    KW - IR-14384

    KW - EWI-13846

    U2 - 10.1088/0960-1317/5/2/034

    DO - 10.1088/0960-1317/5/2/034

    M3 - Article

    VL - 1995

    SP - 183

    EP - 185

    JO - Journal of micromechanics and microengineering

    JF - Journal of micromechanics and microengineering

    SN - 0960-1317

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