Q-factor dependence of one-port encapsulated polysilicon resonator on reactive sealing pressure

C. Gui, R. Legtenberg, Rob Legtenberg, Michael Curt Elwenspoek, J.H.J. Fluitman

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    Abstract

    Micromachined encapsulated polysilicon resonators have been fabricated in different reactive sealing pressure, 200, 50 and 20 mTorr, in order to investigate the dependence of the Q-factors on the sealing pressure. Q-factors as high as 2700 have been measured. The experimental results show that the Q-factors of one-port encapsulated resonators are proportional to 1/p and the resonant frequency is independent of the sealing pressure. However, the measured Q-factors are more than two orders of magnitude lower than theoretical prediction.
    Original languageEnglish
    Pages (from-to)183-185
    Number of pages3
    JournalJournal of micromechanics and microengineering
    Volume1995
    Issue number5
    DOIs
    Publication statusPublished - Jun 1995

    Keywords

    • METIS-111578
    • IR-14384
    • EWI-13846

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