Raman micro-spectroscopy for quantitative thickness measurement of nanometer thin polymer films

B. Liszka, Aufrid T.M. Lenferink, G.J. Witkamp, Cornelis Otto

Research output: Contribution to journalArticleAcademicpeer-review

10 Citations (Scopus)

Abstract

The sensitivity of far-field Raman micro-spectroscopy was investigated to determine quantitatively the actual thickness of organic thin films. It is shown that the thickness of organic films can be quantitatively determined down to 3 nm with an error margin of 20% and down to 1.5 nm with an error margin of 100%. Raman imaging of thin-film surfaces with a far-field optical microscope establishes the distribution of a polymer with a lateral resolution of ~400 nm and the homogeneity of the film. Raman images are presented for spin-coated thin films of polysulfone (PSU) with average thicknesses between 3 and 50 nm. In films with an average thickness of 43 nm, the variation in thickness was around 5% for PSU. In films with an average thickness of 3 nm for PSU, the detected thickness variation was 100%. Raman imaging was performed in minutes for a surface area of 900 µm2. The results illustrate the ability of far-field Raman microscopy as a sensitive method to quantitatively determine the thickness of thin films down to the nanometer range.
Original languageEnglish
Pages (from-to)1230-1234
JournalJournal of raman spectroscopy
Volume46
Issue number12
DOIs
Publication statusPublished - 2015

Keywords

  • METIS-313440
  • IR-99831

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