Abstract
The sensitivity of far-field Raman micro-spectroscopy was investigated to determine quantitatively the actual thickness of organic thin films. It is shown that the thickness of organic films can be quantitatively determined down to 3 nm with an error margin of 20% and down to 1.5 nm with an error margin of 100%. Raman imaging of thin-film surfaces with a far-field optical microscope establishes the distribution of a polymer with a lateral resolution of ~400 nm and the homogeneity of the film. Raman images are presented for spin-coated thin films of polysulfone (PSU) with average thicknesses between 3 and 50 nm. In films with an average thickness of 43 nm, the variation in thickness was around 5% for PSU. In films with an average thickness of 3 nm for PSU, the detected thickness variation was 100%. Raman imaging was performed in minutes for a surface area of 900 µm2. The results illustrate the ability of far-field Raman microscopy as a sensitive method to quantitatively determine the thickness of thin films down to the nanometer range.
Original language | English |
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Pages (from-to) | 1230-1234 |
Journal | Journal of raman spectroscopy |
Volume | 46 |
Issue number | 12 |
DOIs | |
Publication status | Published - 2015 |
Keywords
- 2023 OA procedure