Rapid sacrificial layer etching for the fabrication of nanochannels with integrated metal electrodes

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    Abstract

    We present a rapid etch method to surface-micromachine nanochannels with integrated noble metal electrodes using a single metal sacrificial layer. The method is based on the galvanic coupling of a chromium sacrificial layer with gold electrodes, which results in a 10-fold increase in etch rate with respect to conventional single metal etching. The etch process is investigated and characterized by optical and electrochemical measurements, leading to a theoretical explanation of the observed etch rate based on mass transport. Using this explanation we derive some generic design rules for nanochannel fabrication employing sacrificial metal etching.
    Original languageUndefined
    Article number10.1039/b716382g
    Pages (from-to)402-407
    Number of pages6
    JournalLab on a chip
    Volume8
    Issue number302/3
    DOIs
    Publication statusPublished - 15 Jan 2008

    Keywords

    • EWI-13007
    • IR-62375
    • METIS-251054

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