Rapid sacrificial layer etching for the fabrication of nanochannels with integrated metal electrodes

Research output: Contribution to journalArticleAcademicpeer-review

22 Citations (Scopus)

Abstract

We present a rapid etch method to surface-micromachine nanochannels with integrated noble metal electrodes using a single metal sacrificial layer. The method is based on the galvanic coupling of a chromium sacrificial layer with gold electrodes, which results in a 10-fold increase in etch rate with respect to conventional single metal etching. The etch process is investigated and characterized by optical and electrochemical measurements, leading to a theoretical explanation of the observed etch rate based on mass transport. Using this explanation we derive some generic design rules for nanochannel fabrication employing sacrificial metal etching.
Original languageUndefined
Article number10.1039/b716382g
Pages (from-to)402-407
Number of pages6
JournalLab on a chip
Volume8
Issue number302/3
DOIs
Publication statusPublished - 15 Jan 2008

Keywords

  • EWI-13007
  • IR-62375
  • METIS-251054

Cite this

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title = "Rapid sacrificial layer etching for the fabrication of nanochannels with integrated metal electrodes",
abstract = "We present a rapid etch method to surface-micromachine nanochannels with integrated noble metal electrodes using a single metal sacrificial layer. The method is based on the galvanic coupling of a chromium sacrificial layer with gold electrodes, which results in a 10-fold increase in etch rate with respect to conventional single metal etching. The etch process is investigated and characterized by optical and electrochemical measurements, leading to a theoretical explanation of the observed etch rate based on mass transport. Using this explanation we derive some generic design rules for nanochannel fabrication employing sacrificial metal etching.",
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author = "Wouter Sparreboom and Eijkel, {Jan C.T.} and Bomer, {Johan G.} and {van den Berg}, Albert",
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Rapid sacrificial layer etching for the fabrication of nanochannels with integrated metal electrodes. / Sparreboom, Wouter; Eijkel, Jan C.T.; Bomer, Johan G.; van den Berg, Albert.

In: Lab on a chip, Vol. 8, No. 302/3, 10.1039/b716382g, 15.01.2008, p. 402-407.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Rapid sacrificial layer etching for the fabrication of nanochannels with integrated metal electrodes

AU - Sparreboom, Wouter

AU - Eijkel, Jan C.T.

AU - Bomer, Johan G.

AU - van den Berg, Albert

N1 - 10.1039/b716382g

PY - 2008/1/15

Y1 - 2008/1/15

N2 - We present a rapid etch method to surface-micromachine nanochannels with integrated noble metal electrodes using a single metal sacrificial layer. The method is based on the galvanic coupling of a chromium sacrificial layer with gold electrodes, which results in a 10-fold increase in etch rate with respect to conventional single metal etching. The etch process is investigated and characterized by optical and electrochemical measurements, leading to a theoretical explanation of the observed etch rate based on mass transport. Using this explanation we derive some generic design rules for nanochannel fabrication employing sacrificial metal etching.

AB - We present a rapid etch method to surface-micromachine nanochannels with integrated noble metal electrodes using a single metal sacrificial layer. The method is based on the galvanic coupling of a chromium sacrificial layer with gold electrodes, which results in a 10-fold increase in etch rate with respect to conventional single metal etching. The etch process is investigated and characterized by optical and electrochemical measurements, leading to a theoretical explanation of the observed etch rate based on mass transport. Using this explanation we derive some generic design rules for nanochannel fabrication employing sacrificial metal etching.

KW - EWI-13007

KW - IR-62375

KW - METIS-251054

U2 - 10.1039/b716382g

DO - 10.1039/b716382g

M3 - Article

VL - 8

SP - 402

EP - 407

JO - Lab on a chip

JF - Lab on a chip

SN - 1473-0197

IS - 302/3

M1 - 10.1039/b716382g

ER -