Rapid sacrificial layer etching for the fabrication of nanochannels with integrated metal electrodes

    Research output: Contribution to journalArticleAcademicpeer-review

    22 Citations (Scopus)

    Abstract

    We present a rapid etch method to surface-micromachine nanochannels with integrated noble metal electrodes using a single metal sacrificial layer. The method is based on the galvanic coupling of a chromium sacrificial layer with gold electrodes, which results in a 10-fold increase in etch rate with respect to conventional single metal etching. The etch process is investigated and characterized by optical and electrochemical measurements, leading to a theoretical explanation of the observed etch rate based on mass transport. Using this explanation we derive some generic design rules for nanochannel fabrication employing sacrificial metal etching.
    Original languageUndefined
    Article number10.1039/b716382g
    Pages (from-to)402-407
    Number of pages6
    JournalLab on a chip
    Volume8
    Issue number302/3
    DOIs
    Publication statusPublished - 15 Jan 2008

    Keywords

    • EWI-13007
    • IR-62375
    • METIS-251054

    Cite this

    @article{d2da3e26a578472d995ed4b43a012106,
    title = "Rapid sacrificial layer etching for the fabrication of nanochannels with integrated metal electrodes",
    abstract = "We present a rapid etch method to surface-micromachine nanochannels with integrated noble metal electrodes using a single metal sacrificial layer. The method is based on the galvanic coupling of a chromium sacrificial layer with gold electrodes, which results in a 10-fold increase in etch rate with respect to conventional single metal etching. The etch process is investigated and characterized by optical and electrochemical measurements, leading to a theoretical explanation of the observed etch rate based on mass transport. Using this explanation we derive some generic design rules for nanochannel fabrication employing sacrificial metal etching.",
    keywords = "EWI-13007, IR-62375, METIS-251054",
    author = "Wouter Sparreboom and Eijkel, {Jan C.T.} and Bomer, {Johan G.} and {van den Berg}, Albert",
    note = "10.1039/b716382g",
    year = "2008",
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    day = "15",
    doi = "10.1039/b716382g",
    language = "Undefined",
    volume = "8",
    pages = "402--407",
    journal = "Lab on a chip",
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    publisher = "Royal Society of Chemistry",
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    Rapid sacrificial layer etching for the fabrication of nanochannels with integrated metal electrodes. / Sparreboom, Wouter; Eijkel, Jan C.T.; Bomer, Johan G.; van den Berg, Albert.

    In: Lab on a chip, Vol. 8, No. 302/3, 10.1039/b716382g, 15.01.2008, p. 402-407.

    Research output: Contribution to journalArticleAcademicpeer-review

    TY - JOUR

    T1 - Rapid sacrificial layer etching for the fabrication of nanochannels with integrated metal electrodes

    AU - Sparreboom, Wouter

    AU - Eijkel, Jan C.T.

    AU - Bomer, Johan G.

    AU - van den Berg, Albert

    N1 - 10.1039/b716382g

    PY - 2008/1/15

    Y1 - 2008/1/15

    N2 - We present a rapid etch method to surface-micromachine nanochannels with integrated noble metal electrodes using a single metal sacrificial layer. The method is based on the galvanic coupling of a chromium sacrificial layer with gold electrodes, which results in a 10-fold increase in etch rate with respect to conventional single metal etching. The etch process is investigated and characterized by optical and electrochemical measurements, leading to a theoretical explanation of the observed etch rate based on mass transport. Using this explanation we derive some generic design rules for nanochannel fabrication employing sacrificial metal etching.

    AB - We present a rapid etch method to surface-micromachine nanochannels with integrated noble metal electrodes using a single metal sacrificial layer. The method is based on the galvanic coupling of a chromium sacrificial layer with gold electrodes, which results in a 10-fold increase in etch rate with respect to conventional single metal etching. The etch process is investigated and characterized by optical and electrochemical measurements, leading to a theoretical explanation of the observed etch rate based on mass transport. Using this explanation we derive some generic design rules for nanochannel fabrication employing sacrificial metal etching.

    KW - EWI-13007

    KW - IR-62375

    KW - METIS-251054

    U2 - 10.1039/b716382g

    DO - 10.1039/b716382g

    M3 - Article

    VL - 8

    SP - 402

    EP - 407

    JO - Lab on a chip

    JF - Lab on a chip

    SN - 1473-0197

    IS - 302/3

    M1 - 10.1039/b716382g

    ER -