Rapid thermal annealing of low-energy P and B implants in silicon optimized by high-resolution X-ray diffraction

J.G.E. Klappe, I. Barsony, P.H. Woerlee, T.W. Ryan, P. Alkemade

Research output: Contribution to journal › Article › Academic › peer-review

Original language	Undefined
Pages (from-to)	363-366
Journal	Materials Research Society symposia proceedings
Issue number	342
Publication status	Published - 1994

Keywords

@article{3159687b95c749838703a0fa97b2bc8a,

title = "Rapid thermal annealing of low-energy P and B implants in silicon optimized by high-resolution X-ray diffraction",

keywords = "METIS-144349",

author = "J.G.E. Klappe and I. Barsony and P.H. Woerlee and T.W. Ryan and P. Alkemade",

year = "1994",

language = "Undefined",

pages = "363--366",

journal = "Materials Research Society symposia proceedings",

issn = "0272-9172",

publisher = "Materials Research Society",

number = "342",

}

TY - JOUR

T1 - Rapid thermal annealing of low-energy P and B implants in silicon optimized by high-resolution X-ray diffraction

AU - Klappe, J.G.E.

AU - Barsony, I.

AU - Woerlee, P.H.

AU - Ryan, T.W.

AU - Alkemade, P.

PY - 1994

Y1 - 1994

KW - METIS-144349

M3 - Article

SN - 0272-9172

SP - 363

EP - 366

JO - Materials Research Society symposia proceedings

JF - Materials Research Society symposia proceedings

IS - 342

ER -