Rapid thermal anneals of SiO2 layers for non volatile memory applications

J.H. Klootwijk, H. van Kranenburg, P.H. Woerlee, Hans Wallinga

    Research output: Other contribution › Other research output

    Original languageUndefined
    Place of PublicationVeldhoven
    Publication statusPublished - 20 Dec 1995

    Keywords

    • METIS-114873

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