Rate Control in Dual Source Evaporation

T. Wielinga, W. Gruisinga, H. Leeuwis, J.C. Lodder, J.F. van Weers, J.C. Wilmans

    Research output: Contribution to journalArticleAcademicpeer-review

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    Abstract

    Two-component thin films are deposited in a high-vacuum system from two close sources, heated by an electron beam which is deflected between them. By using quartz-crystal monitors the evaporation rates are measured seperately, which is usually considered to be problematical. One rate signal is used to regulate the appropriate deposition rate by controlling the emission current. The other deposition rate is regulated by using the rate signal to control the dwell-time ratio of the electron beam. With this system it is possible to deposit any composition with a good homogeneity, as in our case Gd-Fe and Gd-Co films.
    Original languageUndefined
    Pages (from-to)170-171
    Number of pages2
    JournalJournal of physics E: scientific instruments
    Volume13
    Issue number2
    DOIs
    Publication statusPublished - 1980

    Keywords

    • SMI-TST: From 2006 in EWI-TST
    • IR-60489
    • SMI-MAT: MATERIALS
    • EWI-5666

    Cite this

    Wielinga, T., Gruisinga, W., Leeuwis, H., Lodder, J. C., van Weers, J. F., & Wilmans, J. C. (1980). Rate Control in Dual Source Evaporation. Journal of physics E: scientific instruments, 13(2), 170-171. https://doi.org/10.1088/0022-3735/13/2/014
    Wielinga, T. ; Gruisinga, W. ; Leeuwis, H. ; Lodder, J.C. ; van Weers, J.F. ; Wilmans, J.C. / Rate Control in Dual Source Evaporation. In: Journal of physics E: scientific instruments. 1980 ; Vol. 13, No. 2. pp. 170-171.
    @article{98549bceaae4405caf355ab73e6b1557,
    title = "Rate Control in Dual Source Evaporation",
    abstract = "Two-component thin films are deposited in a high-vacuum system from two close sources, heated by an electron beam which is deflected between them. By using quartz-crystal monitors the evaporation rates are measured seperately, which is usually considered to be problematical. One rate signal is used to regulate the appropriate deposition rate by controlling the emission current. The other deposition rate is regulated by using the rate signal to control the dwell-time ratio of the electron beam. With this system it is possible to deposit any composition with a good homogeneity, as in our case Gd-Fe and Gd-Co films.",
    keywords = "SMI-TST: From 2006 in EWI-TST, IR-60489, SMI-MAT: MATERIALS, EWI-5666",
    author = "T. Wielinga and W. Gruisinga and H. Leeuwis and J.C. Lodder and {van Weers}, J.F. and J.C. Wilmans",
    note = "Imported from SMI Reference manager",
    year = "1980",
    doi = "10.1088/0022-3735/13/2/014",
    language = "Undefined",
    volume = "13",
    pages = "170--171",
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    Wielinga, T, Gruisinga, W, Leeuwis, H, Lodder, JC, van Weers, JF & Wilmans, JC 1980, 'Rate Control in Dual Source Evaporation' Journal of physics E: scientific instruments, vol. 13, no. 2, pp. 170-171. https://doi.org/10.1088/0022-3735/13/2/014

    Rate Control in Dual Source Evaporation. / Wielinga, T.; Gruisinga, W.; Leeuwis, H.; Lodder, J.C.; van Weers, J.F.; Wilmans, J.C.

    In: Journal of physics E: scientific instruments, Vol. 13, No. 2, 1980, p. 170-171.

    Research output: Contribution to journalArticleAcademicpeer-review

    TY - JOUR

    T1 - Rate Control in Dual Source Evaporation

    AU - Wielinga, T.

    AU - Gruisinga, W.

    AU - Leeuwis, H.

    AU - Lodder, J.C.

    AU - van Weers, J.F.

    AU - Wilmans, J.C.

    N1 - Imported from SMI Reference manager

    PY - 1980

    Y1 - 1980

    N2 - Two-component thin films are deposited in a high-vacuum system from two close sources, heated by an electron beam which is deflected between them. By using quartz-crystal monitors the evaporation rates are measured seperately, which is usually considered to be problematical. One rate signal is used to regulate the appropriate deposition rate by controlling the emission current. The other deposition rate is regulated by using the rate signal to control the dwell-time ratio of the electron beam. With this system it is possible to deposit any composition with a good homogeneity, as in our case Gd-Fe and Gd-Co films.

    AB - Two-component thin films are deposited in a high-vacuum system from two close sources, heated by an electron beam which is deflected between them. By using quartz-crystal monitors the evaporation rates are measured seperately, which is usually considered to be problematical. One rate signal is used to regulate the appropriate deposition rate by controlling the emission current. The other deposition rate is regulated by using the rate signal to control the dwell-time ratio of the electron beam. With this system it is possible to deposit any composition with a good homogeneity, as in our case Gd-Fe and Gd-Co films.

    KW - SMI-TST: From 2006 in EWI-TST

    KW - IR-60489

    KW - SMI-MAT: MATERIALS

    KW - EWI-5666

    U2 - 10.1088/0022-3735/13/2/014

    DO - 10.1088/0022-3735/13/2/014

    M3 - Article

    VL - 13

    SP - 170

    EP - 171

    JO - Measurement science and technology

    JF - Measurement science and technology

    SN - 0957-0233

    IS - 2

    ER -

    Wielinga T, Gruisinga W, Leeuwis H, Lodder JC, van Weers JF, Wilmans JC. Rate Control in Dual Source Evaporation. Journal of physics E: scientific instruments. 1980;13(2):170-171. https://doi.org/10.1088/0022-3735/13/2/014