Rate Control in Dual Source Evaporation

T. Wielinga, W. Gruisinga, H. Leeuwis, J.C. Lodder, J.F. van Weers, J.C. Wilmans

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    Abstract

    Two-component thin films are deposited in a high-vacuum system from two close sources, heated by an electron beam which is deflected between them. By using quartz-crystal monitors the evaporation rates are measured seperately, which is usually considered to be problematical. One rate signal is used to regulate the appropriate deposition rate by controlling the emission current. The other deposition rate is regulated by using the rate signal to control the dwell-time ratio of the electron beam. With this system it is possible to deposit any composition with a good homogeneity, as in our case Gd-Fe and Gd-Co films.
    Original languageUndefined
    Pages (from-to)170-171
    Number of pages2
    JournalJournal of physics E: scientific instruments
    Volume13
    Issue number2
    DOIs
    Publication statusPublished - 1980

    Keywords

    • SMI-TST: From 2006 in EWI-TST
    • IR-60489
    • SMI-MAT: MATERIALS
    • EWI-5666

    Cite this

    Wielinga, T., Gruisinga, W., Leeuwis, H., Lodder, J. C., van Weers, J. F., & Wilmans, J. C. (1980). Rate Control in Dual Source Evaporation. Journal of physics E: scientific instruments, 13(2), 170-171. https://doi.org/10.1088/0022-3735/13/2/014