Reactive Imprint Lithography: Combined Topographical Patterning and Chemical Surface Functionalization of Polystyrene-block-poly(tert-butyl acrylate) Films

Joost Duvigneau, S. Cornelissen, N. Bardaji Valls, Holger Schönherr, Gyula J. Vancso

Research output: Contribution to journalArticleAcademicpeer-review

Original languageEnglish
Pages (from-to)460-468
Number of pages9
JournalAdvanced functional materials
Volume20
Publication statusPublished - 2010

Keywords

  • METIS-269873

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