Abstract
This paper presents a technique for measuring the ratio between two on-chip capacitances which largely eliminates the influence of drift in the electronic measurement circuit. Measurement results on an inline capacitive pressure sensor are presented.
| Original language | English |
|---|---|
| Title of host publication | 41st International Conference on Micro- and Nano-Engineering, MNE 2015 |
| Place of Publication | Enschede |
| Publisher | University of Twente |
| Number of pages | 1 |
| DOIs | |
| Publication status | Published - 21 Sept 2015 |
| Event | 41st International Conference on Micro- and Nano-Engineering, MNE 2015 - The Hague, Netherlands Duration: 21 Sept 2015 → 24 Sept 2015 Conference number: 41 |
Conference
| Conference | 41st International Conference on Micro- and Nano-Engineering, MNE 2015 |
|---|---|
| Abbreviated title | MNE |
| Country/Territory | Netherlands |
| City | The Hague |
| Period | 21/09/15 → 24/09/15 |
Keywords
- Inline pressure sensor
- Capacitive readout
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