Reducing extreme ultraviolet mask three-dimensional effects by alternative metal absorbers

Vicky Philipsen^*, Kim Vu Luong, Laurent Souriau, Andreas Erdmann, Dongbo Xu, Peter Evanschitzky, Robbert W.E. Van De Kruijs, Arash Edrisi, Frank Scholze, Christian Laubis, Mathias Irmscher, Sandra Naasz, Christian Reuter, Eric Hendrickx