Reducing redeposition on KYW waveguides through hard mask engineering

Research output: Contribution to conference › Poster › Other research output

Original language	English
Publication status	Published - 27 Nov 2017
Event	22nd Annual Symposium of the IEEE Photonics Benelux Chapter 2017 - Delft University of Technology, Delft, Netherlands Duration: 27 Nov 2017 → 28 Nov 2017 Conference number: 22

Conference	22nd Annual Symposium of the IEEE Photonics Benelux Chapter 2017
Country/Territory	Netherlands
City	Delft
Period	27/11/17 → 28/11/17

Cite this

@conference{2d90094667ac4d05a657800337e9af02,

title = "Reducing redeposition on KYW waveguides through hard mask engineering",

author = "S.M. Martinussen and M. Dijkstra and \{Garc{\'i}a Blanco\}, S.M.",

year = "2017",

month = nov,

day = "27",

language = "English",

note = "22nd Annual Symposium of the IEEE Photonics Benelux Chapter 2017 ; Conference date: 27-11-2017 Through 28-11-2017",

}