Reduction of interlayer thickness by low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection

V.I.T.A. de Rooij-Lohmann, Andrey Yakshin, E. Zoethout, J. Verhoeven, Frederik Bijkerk

Research output: Contribution to journalArticleAcademicpeer-review

10 Citations (Scopus)
Original languageEnglish
Pages (from-to)6251-6255
Number of pages5
JournalApplied surface science
Volume257
Issue number14
DOIs
Publication statusPublished - 2011

Keywords

  • METIS-277878

Cite this

@article{5af61a07f1664f6893b338bb5e88d5e8,
title = "Reduction of interlayer thickness by low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection",
keywords = "METIS-277878",
author = "{de Rooij-Lohmann}, V.I.T.A. and Andrey Yakshin and E. Zoethout and J. Verhoeven and Frederik Bijkerk",
year = "2011",
doi = "10.1016/j.apsusc.2011.02.054",
language = "English",
volume = "257",
pages = "6251--6255",
journal = "Applied surface science",
issn = "0169-4332",
publisher = "Elsevier",
number = "14",

}

Reduction of interlayer thickness by low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection. / de Rooij-Lohmann, V.I.T.A.; Yakshin, Andrey; Zoethout, E.; Verhoeven, J.; Bijkerk, Frederik.

In: Applied surface science, Vol. 257, No. 14, 2011, p. 6251-6255.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Reduction of interlayer thickness by low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection

AU - de Rooij-Lohmann, V.I.T.A.

AU - Yakshin, Andrey

AU - Zoethout, E.

AU - Verhoeven, J.

AU - Bijkerk, Frederik

PY - 2011

Y1 - 2011

KW - METIS-277878

U2 - 10.1016/j.apsusc.2011.02.054

DO - 10.1016/j.apsusc.2011.02.054

M3 - Article

VL - 257

SP - 6251

EP - 6255

JO - Applied surface science

JF - Applied surface science

SN - 0169-4332

IS - 14

ER -