| Original language | English |
|---|---|
| Pages (from-to) | 6251-6255 |
| Number of pages | 5 |
| Journal | Applied surface science |
| Volume | 257 |
| Issue number | 14 |
| DOIs | |
| Publication status | Published - 2011 |
Keywords
- METIS-277878
Cite this
}
Reduction of interlayer thickness by low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection. / de Rooij-Lohmann, V.I.T.A.; Yakshin, Andrey; Zoethout, E.; Verhoeven, J.; Bijkerk, Frederik.
In: Applied surface science, Vol. 257, No. 14, 2011, p. 6251-6255.Research output: Contribution to journal › Article › Academic › peer-review
TY - JOUR
T1 - Reduction of interlayer thickness by low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection
AU - de Rooij-Lohmann, V.I.T.A.
AU - Yakshin, Andrey
AU - Zoethout, E.
AU - Verhoeven, J.
AU - Bijkerk, Frederik
PY - 2011
Y1 - 2011
KW - METIS-277878
U2 - 10.1016/j.apsusc.2011.02.054
DO - 10.1016/j.apsusc.2011.02.054
M3 - Article
VL - 257
SP - 6251
EP - 6255
JO - Applied surface science
JF - Applied surface science
SN - 0169-4332
IS - 14
ER -