Reduction of interlayer thickness by low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection

V.I.T.A. de Rooij-Lohmann, A.E. Yakshin, E. Zoethout, J. Verhoeven, F. Bijkerk

Laser Physics & Nonlinear Optics

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2011
Reduction of interlayer thickness by low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection
de Rooij-Lohmann, V. I. T. A., Yakshin, A. E., Zoethout, E., Verhoeven, J. & Bijkerk, F., 2011, In: Applied surface science. 257, 14, p. 6251-6255 5 p.
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