Reduction of secondary defect formation in MeV As-ion implanted Si(100)

R.J. Schreutelkamp, W.X. Lu, J.R. Liefting, V. Raineri, J.S. Custer, F.W. Saris

Research output: Contribution to journalArticleAcademicpeer-review

5 Citations (Scopus)
2 Downloads (Pure)
Original languageEnglish
Pages (from-to)614-618
Number of pages0
JournalNuclear instruments and methods in physics research. Section B : Beam interactions with materials and atoms
Volume59-60
Issue numberPart 1
DOIs
Publication statusPublished - 1991
Externally publishedYes

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