Original language | English |
---|---|
Pages (from-to) | 614-618 |
Number of pages | 0 |
Journal | Nuclear instruments and methods in physics research. Section B : Beam interactions with materials and atoms |
Volume | 59-60 |
Issue number | Part 1 |
DOIs | |
Publication status | Published - 1991 |
Externally published | Yes |
Reduction of secondary defect formation in MeV As-ion implanted Si(100)
R.J. Schreutelkamp, W.X. Lu, J.R. Liefting, V. Raineri, J.S. Custer, F.W. Saris
Research output: Contribution to journal › Article › Academic › peer-review
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