Reflective element for EUV lithography device

Andrey Yakshin (Inventor), Robbert Wilhelmus Elisabeth van de Kruijs (Inventor), Frederik Bijkerk (Inventor), Eric Louis (Inventor), I. Nedelcu (Inventor)

Research output: Patent


A reflective optical; element exhibits an increase in the maximum reflectivity at operating wavelengths in the extreme ultraviolet or soft x-ray wavelength range. A first additional intermediate layer (23a, 23b) and a second additional intermediate layer (24a, 24b) are provided between the absorber layer (22) and the spacer layer (21), wherein the first additional intermediate layer increases the reflectivity and the second additional intermediate layer (24a,b,) prevents chemical interaction between the first additional intermediate layer (23 a,b) and the adjoining spacer layer (21) and/or the absorber layer.
Original languageEnglish
Patent numberUS20090536251 20090805
Priority date5/08/09
Publication statusSubmitted - 2010


  • METIS-316948


Dive into the research topics of 'Reflective element for EUV lithography device'. Together they form a unique fingerprint.

Cite this