REFLECTIVE OPTICAL ELEMENT AND METHOD OF MANUFACTURING THE SAME

Tim Tsarfati (Inventor), Erwin Zoethout (Inventor), Eric Louis (Inventor), Frederik Bijkerk (Inventor)

Research output: PatentProfessional

Abstract

A reflective optical element e.g. for use in EUV lithography, configured for an operating wavelength in the soft X-ray or extreme ultraviolet wavelength range, includes a multilayer system (20) with respective layers of at least two alternating materials (21, 22) having differing real parts of the refractive index at the operating wavelength. Preferably, at least at an interface from the material (21) having the higher real part of the refractive index to the material (22) having the lower real part of the refractive index, a further layer (23) of a nitride or a carbide of the material (22) having the lower real part is arranged. Particularly preferably the material (22) having the lower real part of the refractive index is lanthanum or thorium.; Preferably, the layers (21, 22, 23) of at least one material are applied in a plasma-based process for manufacturing a reflective optical element as described.

Original languageEnglish
Patent numberUS2011194087
IPCH05H 1/ 24 A I
Priority date7/01/11
Publication statusPublished - 11 Aug 2011

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manufacturing
refractivity
wavelengths
thorium
lanthanum
carbides
nitrides
lithography
x rays

Cite this

Tsarfati, T., Zoethout, E., Louis, E., & Bijkerk, F. (2011). IPC No. H05H 1/ 24 A I. REFLECTIVE OPTICAL ELEMENT AND METHOD OF MANUFACTURING THE SAME. (Patent No. US2011194087).
Tsarfati, Tim (Inventor) ; Zoethout, Erwin (Inventor) ; Louis, Eric (Inventor) ; Bijkerk, Frederik (Inventor). / REFLECTIVE OPTICAL ELEMENT AND METHOD OF MANUFACTURING THE SAME. IPC No.: H05H 1/ 24 A I. Patent No.: US2011194087.
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abstract = "A reflective optical element e.g. for use in EUV lithography, configured for an operating wavelength in the soft X-ray or extreme ultraviolet wavelength range, includes a multilayer system (20) with respective layers of at least two alternating materials (21, 22) having differing real parts of the refractive index at the operating wavelength. Preferably, at least at an interface from the material (21) having the higher real part of the refractive index to the material (22) having the lower real part of the refractive index, a further layer (23) of a nitride or a carbide of the material (22) having the lower real part is arranged. Particularly preferably the material (22) having the lower real part of the refractive index is lanthanum or thorium.; Preferably, the layers (21, 22, 23) of at least one material are applied in a plasma-based process for manufacturing a reflective optical element as described.",
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Tsarfati, T, Zoethout, E, Louis, E & Bijkerk, F 2011, REFLECTIVE OPTICAL ELEMENT AND METHOD OF MANUFACTURING THE SAME, Patent No. US2011194087, IPC No. H05H 1/ 24 A I.

REFLECTIVE OPTICAL ELEMENT AND METHOD OF MANUFACTURING THE SAME. / Tsarfati, Tim (Inventor); Zoethout, Erwin (Inventor); Louis, Eric (Inventor); Bijkerk, Frederik (Inventor).

IPC No.: H05H 1/ 24 A I. Patent No.: US2011194087.

Research output: PatentProfessional

TY - PAT

T1 - REFLECTIVE OPTICAL ELEMENT AND METHOD OF MANUFACTURING THE SAME

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AU - Zoethout, Erwin

AU - Louis, Eric

AU - Bijkerk, Frederik

PY - 2011/8/11

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N2 - A reflective optical element e.g. for use in EUV lithography, configured for an operating wavelength in the soft X-ray or extreme ultraviolet wavelength range, includes a multilayer system (20) with respective layers of at least two alternating materials (21, 22) having differing real parts of the refractive index at the operating wavelength. Preferably, at least at an interface from the material (21) having the higher real part of the refractive index to the material (22) having the lower real part of the refractive index, a further layer (23) of a nitride or a carbide of the material (22) having the lower real part is arranged. Particularly preferably the material (22) having the lower real part of the refractive index is lanthanum or thorium.; Preferably, the layers (21, 22, 23) of at least one material are applied in a plasma-based process for manufacturing a reflective optical element as described.

AB - A reflective optical element e.g. for use in EUV lithography, configured for an operating wavelength in the soft X-ray or extreme ultraviolet wavelength range, includes a multilayer system (20) with respective layers of at least two alternating materials (21, 22) having differing real parts of the refractive index at the operating wavelength. Preferably, at least at an interface from the material (21) having the higher real part of the refractive index to the material (22) having the lower real part of the refractive index, a further layer (23) of a nitride or a carbide of the material (22) having the lower real part is arranged. Particularly preferably the material (22) having the lower real part of the refractive index is lanthanum or thorium.; Preferably, the layers (21, 22, 23) of at least one material are applied in a plasma-based process for manufacturing a reflective optical element as described.

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Tsarfati T, Zoethout E, Louis E, Bijkerk F, inventors. REFLECTIVE OPTICAL ELEMENT AND METHOD OF MANUFACTURING THE SAME. H05H 1/ 24 A I. 2011 Aug 11.