Abstract
A reflective optical element for an operating wavelength in the soft x-ray and extreme ultraviolet wavelength range, in particular for use in an EUV lithography device, which has a multilayer system made of at least two alternating materials having different real parts of the index of refraction at the operating wavelength, wherein two additional layers (23, 23a,b, 24, 24a,b) of a particular further material are situated adjoining at least one of the two alternating materials (21, 22), and wherein the two additional layers (23a,b, 24a,b) are chosen differently at a transition from the material (22) having a lower real part of the index of refraction to the material (21) having a higher real part of the index of refraction than at a transition from the material (21) having a higher real part of the index of refraction to the material (22) having a lower real part of the index of refraction.
| Original language | English |
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| Patent number | TW200835943 |
| IPC | G02B 5/ 12 A I |
| Priority date | 5/02/07 |
| Publication status | Published - 1 Sept 2008 |