The normal-incidence reflectivity data of Mo/Si multilayer systems are reported for the extreme ultraviolet (EUV) wavelength range. The method employed is e-beam evaporation and ion-beam smoothening of the layer surfaces after growth of the separate layers. Grazing-incidence reflectivity measurements, using Cu-Ka radiation in θ-2θ measurements, showed a high-frequency roughness component of 0.3 nm, while atomic force microscopy characterization of the top surface of full stack multilayers showed a roughness down to 0.1 nm. High resolution transmission electron microscopy inspection conformed that the interface roughness was constant throughout the full stack.
|Number of pages||2|
|Journal||Proceedings of SPIE - the international society for optical engineering|
|Publication status||Published - 1 Jan 1999|
|Event||Emerging Lithographic Technologies III 1999 - Santa Clara, United States|
Duration: 15 Mar 1999 → 17 Mar 1999
Conference number: 3