Reflektives optisches Element und Verfahren zu seiner Herstellung/ Method to enhance layer contrast of a multilayer for reflection at the B absorption edge

T. Tsarfati (Inventor), E. Zoethout (Inventor), Eric Louis (Inventor), Frederik Bijkerk (Inventor)

Research output: Patent


Lithography applications beyond EUVL are expected to use 6.72 nm radiation. In this spectral region no transparent materials exist, therefore mirrors have to be used as optical elements. Spacer materials of interest in reflective optics for λ > 6.65 nm are B and B4C. Simulations show that La is a suited refractive material, because of its relatively low absorbtion and high optical contrast with B and B4C.
Original languageGerman
Patent number# US 61/079307 (US); # DE102008040265 (Germany)
Priority date30/05/09
Publication statusSubmitted - 2010


  • METIS-316947

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