Reflektives optisches Element und Verfahren zu seiner Herstellung/ Method to enhance layer contrast of a multilayer for reflection at the B absorption edge

T. Tsarfati; E. Zoethout; Eric Louis; Frederik Bijkerk

Reflektives optisches Element und Verfahren zu seiner Herstellung/ Method to enhance layer contrast of a multilayer for reflection at the B absorption edge

T. Tsarfati (Inventor), E. Zoethout (Inventor), Eric Louis (Inventor), Frederik Bijkerk (Inventor)

Research output: Patent

Abstract

Lithography applications beyond EUVL are expected to use 6.72 nm radiation. In this spectral region no transparent materials exist, therefore mirrors have to be used as optical elements. Spacer materials of interest in reflective optics for λ > 6.65 nm are B and B4C. Simulations show that La is a suited refractive material, because of its relatively low absorbtion and high optical contrast with B and B4C.

Original language	German
Patent number	# US 61/079307 (US); # DE102008040265 (Germany)
Priority date	30/05/09
Publication status	Submitted - 2010

Keywords

METIS-316947

Cite this

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title = "Reflektives optisches Element und Verfahren zu seiner Herstellung/ Method to enhance layer contrast of a multilayer for reflection at the B absorption edge",

abstract = "Lithography applications beyond EUVL are expected to use 6.72 nm radiation. In this spectral region no transparent materials exist, therefore mirrors have to be used as optical elements. Spacer materials of interest in reflective optics for λ > 6.65 nm are B and B4C. Simulations show that La is a suited refractive material, because of its relatively low absorbtion and high optical contrast with B and B4C.",

keywords = "METIS-316947",

author = "T. Tsarfati and E. Zoethout and Eric Louis and Frederik Bijkerk",

note = "Old title: Method to enhance layer contrast of a multilayer for reflection at the B absorption edge ; # US 61/079307 (US); # DE102008040265 (Germany)",

year = "2010",

language = "German",

type = "Patent",

}

TY - PAT

T1 - Reflektives optisches Element und Verfahren zu seiner Herstellung/ Method to enhance layer contrast of a multilayer for reflection at the B absorption edge

AU - Tsarfati, T.

AU - Zoethout, E.

AU - Louis, Eric

AU - Bijkerk, Frederik

N1 - Old title: Method to enhance layer contrast of a multilayer for reflection at the B absorption edge

PY - 2010

Y1 - 2010

N2 - Lithography applications beyond EUVL are expected to use 6.72 nm radiation. In this spectral region no transparent materials exist, therefore mirrors have to be used as optical elements. Spacer materials of interest in reflective optics for λ > 6.65 nm are B and B4C. Simulations show that La is a suited refractive material, because of its relatively low absorbtion and high optical contrast with B and B4C.

AB - Lithography applications beyond EUVL are expected to use 6.72 nm radiation. In this spectral region no transparent materials exist, therefore mirrors have to be used as optical elements. Spacer materials of interest in reflective optics for λ > 6.65 nm are B and B4C. Simulations show that La is a suited refractive material, because of its relatively low absorbtion and high optical contrast with B and B4C.

KW - METIS-316947

M3 - Patent

M1 - # US 61/079307 (US); # DE102008040265 (Germany)

ER -