Relative oxidation state of the target as guideline for depositing optical quality RF reactive magnetron sputtered Al2O3 layers

Carlijn I. Van Emmerik, Ward A.P.M. Hendriks, Martijn Leendert Stok, Michiel De Goede, Lantian Chang, Meindert Dijkstra, Frans Segerink, Dominic Post, Enrico G. Keim, Mike J. Dikkers, Sonia M. García-blanco*

*Corresponding author for this work

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Engineering & Materials Science

Chemical Compounds