Reorientation of magnetic anisotropy in obliquely sputtered metallic thin films

A. Lisfi, J.C. Lodder, Herbert Wormeester, Bene Poelsema

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Abstract

Reorientation in the magnetic anisotropy as a function of film thickness has been observed in Co-Ni and Co thin films, obliquely sputtered on a polyethylene terephthalate substrate at a large incidence angle (70°). This effect is a consequence of the low magnetocrystalline anisotropy of the films ~fcc structure of Co! and changes in microstructure from nuclei to columns according to the thickness. The critical thickness for this transition was estimated to be 30 nm for Co-Ni.
Original languageUndefined
Pages (from-to)172420-1/5
Number of pages5
JournalPhysical review B: Condensed matter and materials physics
Volume66
Issue number17
DOIs
Publication statusPublished - 2002

Keywords

  • EWI-5544
  • IR-44064
  • SMI-TST: From 2006 in EWI-TST
  • METIS-208311
  • SMI-MAT: MATERIALS

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