Reorientation of magnetic anisotropy in obliquely sputtered metallic thin films

A. Lisfi; J.C. Lodder; Herbert Wormeester; Bene Poelsema

doi:10.1103/PhysRevB.66.174420

Reorientation of magnetic anisotropy in obliquely sputtered metallic thin films

A. Lisfi, J.C. Lodder, Herbert Wormeester, Bene Poelsema

Research output: Contribution to journal › Article › Academic › peer-review

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Abstract

Reorientation in the magnetic anisotropy as a function of film thickness has been observed in Co-Ni and Co thin films, obliquely sputtered on a polyethylene terephthalate substrate at a large incidence angle (70°). This effect is a consequence of the low magnetocrystalline anisotropy of the films ~fcc structure of Co! and changes in microstructure from nuclei to columns according to the thickness. The critical thickness for this transition was estimated to be 30 nm for Co-Ni.

Original language	Undefined
Pages (from-to)	172420-1/5
Number of pages	5
Journal	Physical review B: Condensed matter and materials physics
Volume	66
Issue number	17
DOIs	https://doi.org/10.1103/PhysRevB.66.174420
Publication status	Published - 2002

Keywords

EWI-5544
IR-44064
SMI-TST: From 2006 in EWI-TST
METIS-208311
SMI-MAT: MATERIALS

Access to Document

10.1103/PhysRevB.66.174420

reorientation

http://eprints.eemcs.utwente.nl/secure2/5544/01/LISFI2002B.PDF

Cite this

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title = "Reorientation of magnetic anisotropy in obliquely sputtered metallic thin films",

abstract = "Reorientation in the magnetic anisotropy as a function of film thickness has been observed in Co-Ni and Co thin films, obliquely sputtered on a polyethylene terephthalate substrate at a large incidence angle (70°). This effect is a consequence of the low magnetocrystalline anisotropy of the films ~fcc structure of Co! and changes in microstructure from nuclei to columns according to the thickness. The critical thickness for this transition was estimated to be 30 nm for Co-Ni.",

keywords = "EWI-5544, IR-44064, SMI-TST: From 2006 in EWI-TST, METIS-208311, SMI-MAT: MATERIALS",

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year = "2002",

doi = "10.1103/PhysRevB.66.174420",

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T1 - Reorientation of magnetic anisotropy in obliquely sputtered metallic thin films

AU - Lisfi, A.

AU - Lodder, J.C.

AU - Wormeester, Herbert

AU - Poelsema, Bene

N1 - Imported from SMI Reference manager

PY - 2002

Y1 - 2002

N2 - Reorientation in the magnetic anisotropy as a function of film thickness has been observed in Co-Ni and Co thin films, obliquely sputtered on a polyethylene terephthalate substrate at a large incidence angle (70°). This effect is a consequence of the low magnetocrystalline anisotropy of the films ~fcc structure of Co! and changes in microstructure from nuclei to columns according to the thickness. The critical thickness for this transition was estimated to be 30 nm for Co-Ni.

AB - Reorientation in the magnetic anisotropy as a function of film thickness has been observed in Co-Ni and Co thin films, obliquely sputtered on a polyethylene terephthalate substrate at a large incidence angle (70°). This effect is a consequence of the low magnetocrystalline anisotropy of the films ~fcc structure of Co! and changes in microstructure from nuclei to columns according to the thickness. The critical thickness for this transition was estimated to be 30 nm for Co-Ni.

KW - EWI-5544

KW - IR-44064

KW - SMI-TST: From 2006 in EWI-TST

KW - METIS-208311

KW - SMI-MAT: MATERIALS

U2 - 10.1103/PhysRevB.66.174420

DO - 10.1103/PhysRevB.66.174420

M3 - Article

SN - 1098-0121

VL - 66

SP - 172420-1/5

JO - Physical review B: Condensed matter and materials physics

JF - Physical review B: Condensed matter and materials physics

IS - 17

ER -