Replication molds having nanometer-scale shape control fabricated by means of oxidation and etching

G.M. Kim; Alexeij Y. Kovalgin; J. Holleman; J.P. Brugger

doi:10.1166/jnn.2002.073

Replication molds having nanometer-scale shape control fabricated by means of oxidation and etching

G.M. Kim, Alexeij Y. Kovalgin, J. Holleman, J.P. Brugger

Optical Sciences

Research output: Contribution to journal › Article › Academic › peer-review

20 Citations (Scopus)

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Abstract

A means of accurate control of the curvature radius of molds that are used in nanostructure replication techniques is presented. The local non-uniform growth of SiO2 at regions with high curvature is used to fabricate molds with a curvature radius ranging anywhere between 10 and 250 nm. The mold radius is predicted by numerical simulation as a function of oxidation tempera- ture and time and con

Original language	English
Pages (from-to)	55-59
Number of pages	5
Journal	Journal of nanoscience and nanotechnology
Volume	2
Issue number	1
DOIs	https://doi.org/10.1166/jnn.2002.073
Publication status	Published - 1 Feb 2002

Keywords

EWI-15577
METIS-210018
Soft Lithography
IR-67752
Nanoprobe
Nanomold
EPON SU-8
Oxidation Sharpening
Replication

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10.1166/jnn.2002.073

http://eprints.eemcs.utwente.nl/secure2/15577/01/kim_kovalgin_jnn.pdf

Cite this

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title = "Replication molds having nanometer-scale shape control fabricated by means of oxidation and etching",

abstract = "A means of accurate control of the curvature radius of molds that are used in nanostructure replication techniques is presented. The local non-uniform growth of SiO2 at regions with high curvature is used to fabricate molds with a curvature radius ranging anywhere between 10 and 250 nm. The mold radius is predicted by numerical simulation as a function of oxidation tempera- ture and time and con",

keywords = "EWI-15577, METIS-210018, Soft Lithography, IR-67752, Nanoprobe, Nanomold, EPON SU-8, Oxidation Sharpening, Replication",

author = "G.M. Kim and Kovalgin, {Alexeij Y.} and J. Holleman and J.P. Brugger",

year = "2002",

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AU - Kim, G.M.

AU - Kovalgin, Alexeij Y.

AU - Holleman, J.

AU - Brugger, J.P.

PY - 2002/2/1

Y1 - 2002/2/1

N2 - A means of accurate control of the curvature radius of molds that are used in nanostructure replication techniques is presented. The local non-uniform growth of SiO2 at regions with high curvature is used to fabricate molds with a curvature radius ranging anywhere between 10 and 250 nm. The mold radius is predicted by numerical simulation as a function of oxidation tempera- ture and time and con

AB - A means of accurate control of the curvature radius of molds that are used in nanostructure replication techniques is presented. The local non-uniform growth of SiO2 at regions with high curvature is used to fabricate molds with a curvature radius ranging anywhere between 10 and 250 nm. The mold radius is predicted by numerical simulation as a function of oxidation tempera- ture and time and con

KW - EWI-15577

KW - METIS-210018

KW - Soft Lithography

KW - IR-67752

KW - Nanoprobe

KW - Nanomold

KW - EPON SU-8

KW - Oxidation Sharpening

KW - Replication

U2 - 10.1166/jnn.2002.073

DO - 10.1166/jnn.2002.073

M3 - Article

SN - 1533-4880

VL - 2

SP - 55

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JO - Journal of nanoscience and nanotechnology

JF - Journal of nanoscience and nanotechnology

IS - 1

ER -

Replication molds having nanometer-scale shape control fabricated by means of oxidation and etching

Abstract

Keywords

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