R.F. planar magnetron sputtered ZnO films I: structural properties

F.C.M. van de Pol, F.R. Blom, Th.J.A. Popma

    Research output: Contribution to journalArticleAcademicpeer-review

    134 Citations (Scopus)
    287 Downloads (Pure)


    The structural properties of r.f. planar magnetron sputtered ZnO films are studied as a function of deposition parameters: substrate type, substrate temperature, sputter gas pressure, growth rate and sputtering power. These films are applied as piezoelectric transducers in micromechanical sensors and actuators. The electric properties, and consequently the piezoelectric behaviour, depend strongly on the structural properties of the layers. All films are polycrystalline. The individual grains are highly oriented with their crystallographic c axis perpendicular to the substrate. Crystalline substrates such as silicon or SiO2 induce a growth of small grains, a few hundredths of a micron wide and long. Amorphous substrates such as metals or amorphous SiO2 induce a growth of broad columnar grains extending through the film thickness and a few tenths of a micron wide. Trends in density and grain size are in agreement with Thornton's structure zone model.
    Original languageEnglish
    Pages (from-to)349-364
    JournalThin solid films
    Issue number2
    Publication statusPublished - 1991


    Dive into the research topics of 'R.F. planar magnetron sputtered ZnO films I: structural properties'. Together they form a unique fingerprint.

    Cite this