Room Temperature SiO2 films by Multipolar ECR PECVD

Room Temperature SiO₂ films by Multipolar ECR PECVD

I.G. Isai, A.Y. Kovalgin, J. Holleman, P.H. Woerlee, H. Wallinga

Research output: Contribution to conference › Poster › Academic

Original language	English
Publication status	Published - 2001
Event	13th European Conference on Chemical Vapor Deposition 2001 - Athens, Greece Duration: 26 Aug 2001 → 31 Aug 2001

Conference	13th European Conference on Chemical Vapor Deposition 2001
Country/Territory	Greece
City	Athens
Period	26/08/01 → 31/08/01

Room Temperature SiO₂ Films Deposited by Multipolar ECR PECVD
Isai, I. G., Kovalgin, A. Y., Holleman, J., Woerlee, P. H. & Wallinga, H., 2001, In: Journal de physique IV. 11, Pr3, p. 747-753
Research output: Contribution to journal › Conference article › Academic › peer-review

@conference{f11300543436463bbf460e80b8593ed0,

title = "Room Temperature SiO2 films by Multipolar ECR PECVD",

author = "I.G. Isai and A.Y. Kovalgin and J. Holleman and P.H. Woerlee and H. Wallinga",

year = "2001",

language = "English",

note = "13th European Conference on Chemical Vapor Deposition 2001 ; Conference date: 26-08-2001 Through 31-08-2001",

}