RTP annealing of SiO2 layers for non volatile memory application

J.H. Klootwijk, Cora Salm, J.B. Rem, H. van Kranenburg, P.H. Woerlee, Hans Wallinga

    Research output: Other contribution › Other research output

    Original languageUndefined
    Place of PublicationAcquafredda di Maratea, Italy
    Publication statusPublished - 3 Jul 1995

    Keywords

    • METIS-114884

    Cite this