Scalable 3D Nanoparticle Trap for Electron Microscopy Analysis

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Abstract

Arrays of nanoscale pyramidal cages embedded in a silicon nitride membrane are fabricated with an order of magnitude miniaturization in the size of the cages compared to previous work. This becomes possible by combining the previously published wafer‐scale corner lithography process with displacement Talbot lithography, including an additional resist etching step that allows the creation of masking dots with a size down to 50 nm, using a conventional 365 nm UV source. The resulting pyramidal cages have different entrance and exit openings, which allows trapping of nanoparticles within a predefined size range. The cages are arranged in a well‐defined array, which guarantees traceability of individual particles during post‐trapping analysis. Gold nanoparticles with a size of 25, 150, and 200 nm are used to demonstrate the trapping capability of the fabricated devices. The traceability of individual particles is demonstrated by transferring the transmission electron microscopy (TEM) transparent devices between scanning electron microscopy and TEM instruments and relocating a desired collection of particles.
Original languageEnglish
Article number1803283
JournalSmall
Volume14
Issue number48
DOIs
Publication statusPublished - 28 Nov 2018

Keywords

  • 3D nanofabrication
  • displacement Talbot lithography
  • nanoparticle trapping
  • scanning electron microscopy
  • transmission electron microscopy

Cite this

@article{7805d7503139471bab9d38a4e9e0d26f,
title = "Scalable 3D Nanoparticle Trap for Electron Microscopy Analysis",
abstract = "Arrays of nanoscale pyramidal cages embedded in a silicon nitride membrane are fabricated with an order of magnitude miniaturization in the size of the cages compared to previous work. This becomes possible by combining the previously published wafer‐scale corner lithography process with displacement Talbot lithography, including an additional resist etching step that allows the creation of masking dots with a size down to 50 nm, using a conventional 365 nm UV source. The resulting pyramidal cages have different entrance and exit openings, which allows trapping of nanoparticles within a predefined size range. The cages are arranged in a well‐defined array, which guarantees traceability of individual particles during post‐trapping analysis. Gold nanoparticles with a size of 25, 150, and 200 nm are used to demonstrate the trapping capability of the fabricated devices. The traceability of individual particles is demonstrated by transferring the transmission electron microscopy (TEM) transparent devices between scanning electron microscopy and TEM instruments and relocating a desired collection of particles.",
keywords = "3D nanofabrication, displacement Talbot lithography, nanoparticle trapping, scanning electron microscopy, transmission electron microscopy",
author = "Xingwu Sun and Berenschot, {Erwin J. W.} and Henk-Willem Veltkamp and Gardeniers, {Han J. G. E.} and Tas, {Niels R.}",
year = "2018",
month = "11",
day = "28",
doi = "10.1002/smll.201803283",
language = "English",
volume = "14",
journal = "Small",
issn = "1613-6810",
publisher = "Wiley-VCH Verlag",
number = "48",

}

Scalable 3D Nanoparticle Trap for Electron Microscopy Analysis. / Sun, Xingwu; Berenschot, Erwin J. W.; Veltkamp, Henk-Willem; Gardeniers, Han J. G. E.; Tas, Niels R. (Corresponding Author).

In: Small, Vol. 14, No. 48, 1803283, 28.11.2018.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Scalable 3D Nanoparticle Trap for Electron Microscopy Analysis

AU - Sun, Xingwu

AU - Berenschot, Erwin J. W.

AU - Veltkamp, Henk-Willem

AU - Gardeniers, Han J. G. E.

AU - Tas, Niels R.

PY - 2018/11/28

Y1 - 2018/11/28

N2 - Arrays of nanoscale pyramidal cages embedded in a silicon nitride membrane are fabricated with an order of magnitude miniaturization in the size of the cages compared to previous work. This becomes possible by combining the previously published wafer‐scale corner lithography process with displacement Talbot lithography, including an additional resist etching step that allows the creation of masking dots with a size down to 50 nm, using a conventional 365 nm UV source. The resulting pyramidal cages have different entrance and exit openings, which allows trapping of nanoparticles within a predefined size range. The cages are arranged in a well‐defined array, which guarantees traceability of individual particles during post‐trapping analysis. Gold nanoparticles with a size of 25, 150, and 200 nm are used to demonstrate the trapping capability of the fabricated devices. The traceability of individual particles is demonstrated by transferring the transmission electron microscopy (TEM) transparent devices between scanning electron microscopy and TEM instruments and relocating a desired collection of particles.

AB - Arrays of nanoscale pyramidal cages embedded in a silicon nitride membrane are fabricated with an order of magnitude miniaturization in the size of the cages compared to previous work. This becomes possible by combining the previously published wafer‐scale corner lithography process with displacement Talbot lithography, including an additional resist etching step that allows the creation of masking dots with a size down to 50 nm, using a conventional 365 nm UV source. The resulting pyramidal cages have different entrance and exit openings, which allows trapping of nanoparticles within a predefined size range. The cages are arranged in a well‐defined array, which guarantees traceability of individual particles during post‐trapping analysis. Gold nanoparticles with a size of 25, 150, and 200 nm are used to demonstrate the trapping capability of the fabricated devices. The traceability of individual particles is demonstrated by transferring the transmission electron microscopy (TEM) transparent devices between scanning electron microscopy and TEM instruments and relocating a desired collection of particles.

KW - 3D nanofabrication

KW - displacement Talbot lithography

KW - nanoparticle trapping

KW - scanning electron microscopy

KW - transmission electron microscopy

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