Scanning thermal lithography as a tool for highly localized nanoscale chemical surface functionalization

Joost Duvigneau, Holger Schönherr, Gyula J. Vancso

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Original languageEnglish
Title of host publicationProceeding MRS Fall meeting 2010
Pages162.1-162.6
DOIs
Publication statusPublished - 2011

Publication series

Name
Volume1318

Keywords

  • METIS-280646

Cite this

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title = "Scanning thermal lithography as a tool for highly localized nanoscale chemical surface functionalization",
keywords = "METIS-280646",
author = "Joost Duvigneau and Holger Sch{\"o}nherr and Vancso, {Gyula J.}",
year = "2011",
doi = "10.1557/opl.2011.162",
language = "English",
pages = "162.1--162.6",
booktitle = "Proceeding MRS Fall meeting 2010",

}

Scanning thermal lithography as a tool for highly localized nanoscale chemical surface functionalization. / Duvigneau, Joost; Schönherr, Holger; Vancso, Gyula J.

Proceeding MRS Fall meeting 2010. 2011. p. 162.1-162.6.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

TY - GEN

T1 - Scanning thermal lithography as a tool for highly localized nanoscale chemical surface functionalization

AU - Duvigneau, Joost

AU - Schönherr, Holger

AU - Vancso, Gyula J.

PY - 2011

Y1 - 2011

KW - METIS-280646

U2 - 10.1557/opl.2011.162

DO - 10.1557/opl.2011.162

M3 - Conference contribution

SP - 162.1-162.6

BT - Proceeding MRS Fall meeting 2010

ER -