Abstract
Surfaces of Si(111)-(7×7) and Si(100)-(2×1) were bombarded by 3-keV Ar+ ions at doses of ≤1012 ions cm-2 to study the effect of individual ion impacts on the atomic structure of surfaces. Atom-resolved images show damaged regions of missing and displaced atoms. Current-imaging tunneling spectroscopy shows rest-atom states in the bombarded areas on Si(111), in agreement with line-scan measurements indicating a monatomic step-height difference between bombarded and unbombarded areas. Upon annealing to 750 °C for 2 min, complete (7×7) was restored for the bombarded Si(111) surface whereas ordering of vacancies into line defects was observed for Si(100).
Original language | Undefined |
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Pages (from-to) | 7581-7587 |
Number of pages | 7 |
Journal | Physical Review B (Condensed Matter) |
Volume | 0 |
Issue number | 46 |
DOIs | |
Publication status | Published - 1992 |
Keywords
- METIS-128910
- IR-73162