Selective growth of GexSi1-x for elevated source and drain in deep submicron MOS

Cora Salm, P.H. Woerlee

    Research output: Other contributionOther research output

    Original languageUndefined
    Place of PublicationBest Western Dish Hotel, Enschede
    Publication statusPublished - 14 Jun 1995

    Keywords

    • METIS-114880

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