| Original language | Undefined |
|---|---|
| Place of Publication | Best Western Dish Hotel, Enschede |
| Publication status | Published - 14 Jun 1995 |
Keywords
- METIS-114880
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Selective growth of GexSi1-x for elevated source and drain in deep submicron MOS
- Cora Salm
- , P.H. Woerlee
Research output: Other contribution › Other research output