Self-assembled monolayers coatings on nanostencils for the reduction of materials adhesion

M. Kolbel, R.W. Tjerkstra, G.M. Kim, J.P. Brugger, C.J.M. van Rijn, W. Nijdam, Jurriaan Huskens, David Reinhoudt

Research output: Contribution to journalArticleAcademicpeer-review

29 Citations (Scopus)

Abstract

Nanostencils (shadow masks with submicrometer apertures in a thin silicon nitride membrane) are promising tools for the facile one-step generation of nanopatterns of various materials by physical vapor deposition. Evaporation through a shadow mask is accompanied by gradual clogging of the apertures due to adhesion of evaporated material. In order to reduce this effect, nanostencils were coated with alkyl and perfluoroalkyl self-assembled monolayers (SAMs). The formation and properties of SAMs on planar silicon nitride substrates were studied by contact angle goniometry, X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). The SAMs are stable under evaporation of gold at various angles. SAM-coated nanostencils showed considerably less adhesion of gold compared to bare SixNy stencils.
Original languageUndefined
Pages (from-to)219-224
Number of pages6
JournalAdvanced functional materials
Volume13
Issue number3
DOIs
Publication statusPublished - 2003

Keywords

  • IR-40873
  • METIS-215581

Cite this

Kolbel, M. ; Tjerkstra, R.W. ; Kim, G.M. ; Brugger, J.P. ; van Rijn, C.J.M. ; Nijdam, W. ; Huskens, Jurriaan ; Reinhoudt, David. / Self-assembled monolayers coatings on nanostencils for the reduction of materials adhesion. In: Advanced functional materials. 2003 ; Vol. 13, No. 3. pp. 219-224.
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Self-assembled monolayers coatings on nanostencils for the reduction of materials adhesion. / Kolbel, M.; Tjerkstra, R.W.; Kim, G.M.; Brugger, J.P.; van Rijn, C.J.M.; Nijdam, W.; Huskens, Jurriaan; Reinhoudt, David.

In: Advanced functional materials, Vol. 13, No. 3, 2003, p. 219-224.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Self-assembled monolayers coatings on nanostencils for the reduction of materials adhesion

AU - Kolbel, M.

AU - Tjerkstra, R.W.

AU - Kim, G.M.

AU - Brugger, J.P.

AU - van Rijn, C.J.M.

AU - Nijdam, W.

AU - Huskens, Jurriaan

AU - Reinhoudt, David

PY - 2003

Y1 - 2003

N2 - Nanostencils (shadow masks with submicrometer apertures in a thin silicon nitride membrane) are promising tools for the facile one-step generation of nanopatterns of various materials by physical vapor deposition. Evaporation through a shadow mask is accompanied by gradual clogging of the apertures due to adhesion of evaporated material. In order to reduce this effect, nanostencils were coated with alkyl and perfluoroalkyl self-assembled monolayers (SAMs). The formation and properties of SAMs on planar silicon nitride substrates were studied by contact angle goniometry, X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). The SAMs are stable under evaporation of gold at various angles. SAM-coated nanostencils showed considerably less adhesion of gold compared to bare SixNy stencils.

AB - Nanostencils (shadow masks with submicrometer apertures in a thin silicon nitride membrane) are promising tools for the facile one-step generation of nanopatterns of various materials by physical vapor deposition. Evaporation through a shadow mask is accompanied by gradual clogging of the apertures due to adhesion of evaporated material. In order to reduce this effect, nanostencils were coated with alkyl and perfluoroalkyl self-assembled monolayers (SAMs). The formation and properties of SAMs on planar silicon nitride substrates were studied by contact angle goniometry, X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). The SAMs are stable under evaporation of gold at various angles. SAM-coated nanostencils showed considerably less adhesion of gold compared to bare SixNy stencils.

KW - IR-40873

KW - METIS-215581

U2 - 10.1002/adfm.200390033

DO - 10.1002/adfm.200390033

M3 - Article

VL - 13

SP - 219

EP - 224

JO - Advanced functional materials

JF - Advanced functional materials

SN - 1616-301X

IS - 3

ER -