Self-assembled monolayers coatings on nanostencils for the reduction of materials adhesion

M. Kolbel, R.W. Tjerkstra, G.M. Kim, J.P. Brugger, C.J.M. van Rijn, W. Nijdam, Jurriaan Huskens, David Reinhoudt

Research output: Contribution to journalArticleAcademicpeer-review

29 Citations (Scopus)

Abstract

Nanostencils (shadow masks with submicrometer apertures in a thin silicon nitride membrane) are promising tools for the facile one-step generation of nanopatterns of various materials by physical vapor deposition. Evaporation through a shadow mask is accompanied by gradual clogging of the apertures due to adhesion of evaporated material. In order to reduce this effect, nanostencils were coated with alkyl and perfluoroalkyl self-assembled monolayers (SAMs). The formation and properties of SAMs on planar silicon nitride substrates were studied by contact angle goniometry, X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). The SAMs are stable under evaporation of gold at various angles. SAM-coated nanostencils showed considerably less adhesion of gold compared to bare SixNy stencils.
Original languageUndefined
Pages (from-to)219-224
Number of pages6
JournalAdvanced functional materials
Volume13
Issue number3
DOIs
Publication statusPublished - 2003

Keywords

  • IR-40873
  • METIS-215581

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