| Original language | Undefined |
|---|---|
| Pages (from-to) | 1734-1743 |
| Journal | Langmuir |
| Volume | 16 |
| Publication status | Published - 2000 |
Keywords
- METIS-106415
Cite this
Tsao, M. W., Rabolt, J. F., Schönherr, H., & Gastner, D. G. (2000). Semifluorinated/hydrogenated alkylthiol thin films: a comparison between disulfides and thiol binary mixtures. Langmuir, 16, 1734-1743.
@article{ec464e0f498e4ae6a58201cefa307809,
title = "Semifluorinated/hydrogenated alkylthiol thin films: a comparison between disulfides and thiol binary mixtures",
keywords = "METIS-106415",
author = "M.W. Tsao and J.F. Rabolt and Holger Sch{\"o}nherr and D.G. Gastner",
year = "2000",
language = "Undefined",
volume = "16",
pages = "1734--1743",
journal = "Langmuir",
issn = "0743-7463",
publisher = "American Chemical Society",
}
Tsao, MW, Rabolt, JF, Schönherr, H & Gastner, DG 2000, 'Semifluorinated/hydrogenated alkylthiol thin films: a comparison between disulfides and thiol binary mixtures' Langmuir, vol. 16, pp. 1734-1743.
Semifluorinated/hydrogenated alkylthiol thin films: a comparison between disulfides and thiol binary mixtures. / Tsao, M.W.; Rabolt, J.F.; Schönherr, Holger; Gastner, D.G.
In: Langmuir, Vol. 16, 2000, p. 1734-1743.Research output: Contribution to journal › Article › Academic › peer-review
TY - JOUR
T1 - Semifluorinated/hydrogenated alkylthiol thin films: a comparison between disulfides and thiol binary mixtures
AU - Tsao, M.W.
AU - Rabolt, J.F.
AU - Schönherr, Holger
AU - Gastner, D.G.
PY - 2000
Y1 - 2000
KW - METIS-106415
M3 - Article
VL - 16
SP - 1734
EP - 1743
JO - Langmuir
JF - Langmuir
SN - 0743-7463
ER -
Tsao MW, Rabolt JF, Schönherr H, Gastner DG. Semifluorinated/hydrogenated alkylthiol thin films: a comparison between disulfides and thiol binary mixtures. Langmuir. 2000;16:1734-1743.