Shadow mask evaporation through monolayer modified nanostencils

M. Kolbel, R.W. Tjerkstra, J.P. Brugger, C.J.M. van Rijn, W. Nijdam, Jurriaan Huskens, David Reinhoudt

Research output: Contribution to journalArticleAcademic

49 Citations (Scopus)

Abstract

Gradual clogging of the apertures of nanostencils used as miniature shadow masks in metal evaporations can be reduced by coating the stencil with self-assembled monolayers (SAM). This is quantified by the dimensions (height and volume) of gold features obtained by nanostencil evaporation as measured by scanning electron microscopy (SEM) and atomic force microscopy (AFM). An increase in material deposition through the apertures by more than 100% can be achieved with SAM-coated stencils, which increases their lifetime.
Original languageUndefined
Pages (from-to)1339-1343
JournalNano letters
Volume2
Issue number12
DOIs
Publication statusPublished - 2002

Keywords

  • IR-38013
  • METIS-207736

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