Shadow mask evaporation through monolayer modified nanostencils

M. Kolbel; R.W. Tjerkstra; J.P. Brugger; C.J.M. van Rijn; W. Nijdam; Jurriaan Huskens; David Reinhoudt

doi:10.1021/nl025784o

Shadow mask evaporation through monolayer modified nanostencils

M. Kolbel, R.W. Tjerkstra, J.P. Brugger, C.J.M. van Rijn, W. Nijdam, Jurriaan Huskens, David Reinhoudt

Research output: Contribution to journal › Article › Academic

55 Citations (Scopus)

Abstract

Gradual clogging of the apertures of nanostencils used as miniature shadow masks in metal evaporations can be reduced by coating the stencil with self-assembled monolayers (SAM). This is quantified by the dimensions (height and volume) of gold features obtained by nanostencil evaporation as measured by scanning electron microscopy (SEM) and atomic force microscopy (AFM). An increase in material deposition through the apertures by more than 100% can be achieved with SAM-coated stencils, which increases their lifetime.

Original language	Undefined
Pages (from-to)	1339-1343
Journal	Nano letters
Volume	2
Issue number	12
DOIs	https://doi.org/10.1021/nl025784o
Publication status	Published - 2002

Keywords

IR-38013
METIS-207736

Access to Document

10.1021/nl025784o

Cite this

@article{304c05aeff0b48f19c81989cdc280d30,

title = "Shadow mask evaporation through monolayer modified nanostencils",

abstract = "Gradual clogging of the apertures of nanostencils used as miniature shadow masks in metal evaporations can be reduced by coating the stencil with self-assembled monolayers (SAM). This is quantified by the dimensions (height and volume) of gold features obtained by nanostencil evaporation as measured by scanning electron microscopy (SEM) and atomic force microscopy (AFM). An increase in material deposition through the apertures by more than 100% can be achieved with SAM-coated stencils, which increases their lifetime.",

keywords = "IR-38013, METIS-207736",

author = "M. Kolbel and R.W. Tjerkstra and J.P. Brugger and {van Rijn}, C.J.M. and W. Nijdam and Jurriaan Huskens and David Reinhoudt",

note = "706 ",

year = "2002",

doi = "10.1021/nl025784o",

language = "Undefined",

volume = "2",

pages = "1339--1343",

journal = "Nano letters",

issn = "1530-6984",

publisher = "American Chemical Society",

number = "12",

}

TY - JOUR

T1 - Shadow mask evaporation through monolayer modified nanostencils

AU - Kolbel, M.

AU - Tjerkstra, R.W.

AU - Brugger, J.P.

AU - van Rijn, C.J.M.

AU - Nijdam, W.

AU - Huskens, Jurriaan

AU - Reinhoudt, David

N1 - 706

PY - 2002

Y1 - 2002

N2 - Gradual clogging of the apertures of nanostencils used as miniature shadow masks in metal evaporations can be reduced by coating the stencil with self-assembled monolayers (SAM). This is quantified by the dimensions (height and volume) of gold features obtained by nanostencil evaporation as measured by scanning electron microscopy (SEM) and atomic force microscopy (AFM). An increase in material deposition through the apertures by more than 100% can be achieved with SAM-coated stencils, which increases their lifetime.

AB - Gradual clogging of the apertures of nanostencils used as miniature shadow masks in metal evaporations can be reduced by coating the stencil with self-assembled monolayers (SAM). This is quantified by the dimensions (height and volume) of gold features obtained by nanostencil evaporation as measured by scanning electron microscopy (SEM) and atomic force microscopy (AFM). An increase in material deposition through the apertures by more than 100% can be achieved with SAM-coated stencils, which increases their lifetime.

KW - IR-38013

KW - METIS-207736

U2 - 10.1021/nl025784o

DO - 10.1021/nl025784o

M3 - Article

SN - 1530-6984

VL - 2

SP - 1339

EP - 1343

JO - Nano letters

JF - Nano letters

IS - 12

ER -