Si-O bond formation on the Si(100)−2 × 1 surface at the early stage of oxidation as observed by AES

Enrico G. Keim

doi:10.1016/0039-6028(84)90569-7

Si-O bond formation on the Si(100)−2 × 1 surface at the early stage of oxidation as observed by AES

Enrico G. Keim

Physics of Interfaces and Nanomaterials

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Abstract

Auger electron spectroscopy is used to follow the initial chemisorption of oxygen on a Si(100)−2 × 1 surface. Careful measurements of the Si L23VV spectra reveal, for the first time, fine structure in the region between 80 and 85 eV. For the clean Si(100) surface a peak at 81 eV has been found. Oxygen chemisorption on the Si(100) surface is associated with the appearance of a new well defined peak at 83 eV in addition to the peak at 81 eV. Since these features are discernible for the (100) crystal face, the 83 eV transition is assigned as due to the Si---O bond.

Original language	English
Pages (from-to)	L641-L644
Journal	Surface science
Volume	148
Issue number	2-3
DOIs	https://doi.org/10.1016/0039-6028(84)90569-7
Publication status	Published - 1984

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title = "Si-O bond formation on the Si(100)−2 × 1 surface at the early stage of oxidation as observed by AES",

abstract = "Auger electron spectroscopy is used to follow the initial chemisorption of oxygen on a Si(100)−2 × 1 surface. Careful measurements of the Si L23VV spectra reveal, for the first time, fine structure in the region between 80 and 85 eV. For the clean Si(100) surface a peak at 81 eV has been found. Oxygen chemisorption on the Si(100) surface is associated with the appearance of a new well defined peak at 83 eV in addition to the peak at 81 eV. Since these features are discernible for the (100) crystal face, the 83 eV transition is assigned as due to the Si---O bond.",

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T1 - Si-O bond formation on the Si(100)−2 × 1 surface at the early stage of oxidation as observed by AES

AU - Keim, Enrico G.

PY - 1984

Y1 - 1984

N2 - Auger electron spectroscopy is used to follow the initial chemisorption of oxygen on a Si(100)−2 × 1 surface. Careful measurements of the Si L23VV spectra reveal, for the first time, fine structure in the region between 80 and 85 eV. For the clean Si(100) surface a peak at 81 eV has been found. Oxygen chemisorption on the Si(100) surface is associated with the appearance of a new well defined peak at 83 eV in addition to the peak at 81 eV. Since these features are discernible for the (100) crystal face, the 83 eV transition is assigned as due to the Si---O bond.

AB - Auger electron spectroscopy is used to follow the initial chemisorption of oxygen on a Si(100)−2 × 1 surface. Careful measurements of the Si L23VV spectra reveal, for the first time, fine structure in the region between 80 and 85 eV. For the clean Si(100) surface a peak at 81 eV has been found. Oxygen chemisorption on the Si(100) surface is associated with the appearance of a new well defined peak at 83 eV in addition to the peak at 81 eV. Since these features are discernible for the (100) crystal face, the 83 eV transition is assigned as due to the Si---O bond.

U2 - 10.1016/0039-6028(84)90569-7

DO - 10.1016/0039-6028(84)90569-7

M3 - Article

SN - 0039-6028

VL - 148

SP - L641-L644

JO - Surface science

JF - Surface science

IS - 2-3

ER -

Si-O bond formation on the Si(100)−2 × 1 surface at the early stage of oxidation as observed by AES

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