Silicide formation in cosputtered Ti-Si layers

A. Weishaupt

Research output: ThesisPhD Thesis - Research UT, graduation externalAcademic

Original languageEnglish
Awarding Institution
  • University of Twente
Supervisors/Advisors
  • van Silfhout, Arend, Supervisor
Award date22 Mar 1996
Place of PublicationUniversiteit Twente
Publication statusPublished - 22 Mar 1996

Keywords

  • METIS-128295

Cite this

Weishaupt, A. (1996). Silicide formation in cosputtered Ti-Si layers. Universiteit Twente.
Weishaupt, A.. / Silicide formation in cosputtered Ti-Si layers. Universiteit Twente, 1996. 106 p.
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title = "Silicide formation in cosputtered Ti-Si layers",
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author = "A. Weishaupt",
year = "1996",
month = "3",
day = "22",
language = "English",
school = "University of Twente",

}

Weishaupt, A 1996, 'Silicide formation in cosputtered Ti-Si layers', University of Twente, Universiteit Twente.

Silicide formation in cosputtered Ti-Si layers. / Weishaupt, A.

Universiteit Twente, 1996. 106 p.

Research output: ThesisPhD Thesis - Research UT, graduation externalAcademic

TY - THES

T1 - Silicide formation in cosputtered Ti-Si layers

AU - Weishaupt, A.

PY - 1996/3/22

Y1 - 1996/3/22

KW - METIS-128295

M3 - PhD Thesis - Research UT, graduation external

CY - Universiteit Twente

ER -

Weishaupt A. Silicide formation in cosputtered Ti-Si layers. Universiteit Twente, 1996. 106 p.