Silicide formation in cosputtered Ti-Si layers

A. Weishaupt

Research output: ThesisPhD Thesis - Research UT, graduation external

Original languageEnglish
Awarding Institution
  • University of Twente
Supervisors/Advisors
  • van Silfhout, Arend, Supervisor
Award date22 Mar 1996
Place of PublicationUniversiteit Twente
Publication statusPublished - 22 Mar 1996

Keywords

  • METIS-128295

Cite this

Weishaupt, A. (1996). Silicide formation in cosputtered Ti-Si layers. Universiteit Twente.