Silicon-based chlorine sensor with on-wafer deposited chemically anchored diffusion membrane: Part I. Basic sensor concept

Albert van den Berg* (Corresponding Author), Milena Koudelka-Hep, Bart H. van der Schoot, Nico F. de Rooij, Elisabeth Verney-Norberg, Alain Grisel

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

22 Citations (Scopus)
17 Downloads (Pure)

Abstract

A method for on-wafer fabrication of free-chlorine sensors is described. The sensor structure consists of a planar three-electrode electrochemical cell covered with a poly(hydroxyethyl methacylate) hydrogel membrane. This membrane is photolithographically patterned on-wafer. In order to guarantee good adhesion of the membrane to the electrode surface a special oxidation step consisting of a treatment in an oxygen plasma followed by a silanization procedure has been developed. The optimal operatonal polarization voltage of the integrated sensor for detection of hypochlorous acid was found to be 0 mV vs. the non-chip Ag/AgCl reference electrode in a solution of 0.1 M KCl. Sensors with membrane thicknesses of 10 and 50 μm are found to give linear calibration curves between 0.1 and 5 mg 1-1 free chlorine, with sensitivities of 2.0 and 0.4 nA (mg 1-1)-1, respectively.

Original languageEnglish
Pages (from-to)75-82
Number of pages8
JournalAnalytica chimica acta
Volume269
Issue number1
DOIs
Publication statusPublished - 2 Nov 1992
Externally publishedYes

Keywords

  • Chlorine detection
  • Diffusion membrane
  • Sensors
  • Silicon based sensor

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