Silicon nitride nanosieve membrane

D.H. Tong, Henricus V. Jansen, V.J. Gadgil, C.G. Bostan, Johan W. Berenschot, C.J.M. van Rijn, Michael Curt Elwenspoek

    Research output: Contribution to journalArticleAcademicpeer-review

    230 Citations (Scopus)

    Abstract

    An array of very uniform cylindrical nanopores with a pore diameter as small as 25 nm has been fabricated in an ultrathin micromachined silicon nitride membrane using focused ion beam (FIB) etching. The pore size of this nanosieve membrane was further reduced to below 10 nm by coating it with another silicon nitride layer. This nanosieve membrane possesses adequate mechanical strength up to several bars of transmembrane pressure, and it can withstand high temperatures up to 900 C. In addition, it is inert to many aggressive chemicals such as hot concentrated potassium hydroxide (KOH), piranha (H2SO4 + H2O2), and nitric acid (HNO3).
    Original languageUndefined
    Pages (from-to)283-287
    Number of pages5
    JournalNano letters
    Volume4
    Issue number2
    DOIs
    Publication statusPublished - 2004

    Keywords

    • IR-47649
    • TST-FABRICATION
    • IOMS-PCS: PHOTONIC CRYSTAL STRUCTURES
    • EWI-10248
    • METIS-218304

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