Silicon nitride nanosieve membrane

D.H. Tong; Henricus V. Jansen; V.J. Gadgil; C.G. Bostan; Johan W. Berenschot; C.J.M. van Rijn; Michael Curt Elwenspoek

doi:10.1021/nl0350175

Silicon nitride nanosieve membrane

D.H. Tong, Henricus V. Jansen, V.J. Gadgil, C.G. Bostan, Johan W. Berenschot, C.J.M. van Rijn, Michael Curt Elwenspoek

Research output: Contribution to journal › Article › Academic › peer-review

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Abstract

An array of very uniform cylindrical nanopores with a pore diameter as small as 25 nm has been fabricated in an ultrathin micromachined silicon nitride membrane using focused ion beam (FIB) etching. The pore size of this nanosieve membrane was further reduced to below 10 nm by coating it with another silicon nitride layer. This nanosieve membrane possesses adequate mechanical strength up to several bars of transmembrane pressure, and it can withstand high temperatures up to 900 C. In addition, it is inert to many aggressive chemicals such as hot concentrated potassium hydroxide (KOH), piranha (H2SO4 + H2O2), and nitric acid (HNO3).

Original language	Undefined
Pages (from-to)	283-287
Number of pages	5
Journal	Nano letters
Volume	4
Issue number	2
DOIs	https://doi.org/10.1021/nl0350175
Publication status	Published - 2004

Keywords

IR-47649
TST-FABRICATION
IOMS-PCS: PHOTONIC CRYSTAL STRUCTURES
EWI-10248
METIS-218304

Access to Document

10.1021/nl0350175

http://eprints.eemcs.utwente.nl/secure2/10248/01/silicon_nitride_-_tong.pdf

Cite this

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title = "Silicon nitride nanosieve membrane",

abstract = "An array of very uniform cylindrical nanopores with a pore diameter as small as 25 nm has been fabricated in an ultrathin micromachined silicon nitride membrane using focused ion beam (FIB) etching. The pore size of this nanosieve membrane was further reduced to below 10 nm by coating it with another silicon nitride layer. This nanosieve membrane possesses adequate mechanical strength up to several bars of transmembrane pressure, and it can withstand high temperatures up to 900 C. In addition, it is inert to many aggressive chemicals such as hot concentrated potassium hydroxide (KOH), piranha (H2SO4 + H2O2), and nitric acid (HNO3).",

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author = "D.H. Tong and Jansen, {Henricus V.} and V.J. Gadgil and C.G. Bostan and Berenschot, {Johan W.} and {van Rijn}, C.J.M. and Elwenspoek, {Michael Curt}",

year = "2004",

doi = "10.1021/nl0350175",

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journal = "Nano letters",

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TY - JOUR

T1 - Silicon nitride nanosieve membrane

AU - Tong, D.H.

AU - Jansen, Henricus V.

AU - Gadgil, V.J.

AU - Bostan, C.G.

AU - Berenschot, Johan W.

AU - van Rijn, C.J.M.

AU - Elwenspoek, Michael Curt

PY - 2004

Y1 - 2004

N2 - An array of very uniform cylindrical nanopores with a pore diameter as small as 25 nm has been fabricated in an ultrathin micromachined silicon nitride membrane using focused ion beam (FIB) etching. The pore size of this nanosieve membrane was further reduced to below 10 nm by coating it with another silicon nitride layer. This nanosieve membrane possesses adequate mechanical strength up to several bars of transmembrane pressure, and it can withstand high temperatures up to 900 C. In addition, it is inert to many aggressive chemicals such as hot concentrated potassium hydroxide (KOH), piranha (H2SO4 + H2O2), and nitric acid (HNO3).

AB - An array of very uniform cylindrical nanopores with a pore diameter as small as 25 nm has been fabricated in an ultrathin micromachined silicon nitride membrane using focused ion beam (FIB) etching. The pore size of this nanosieve membrane was further reduced to below 10 nm by coating it with another silicon nitride layer. This nanosieve membrane possesses adequate mechanical strength up to several bars of transmembrane pressure, and it can withstand high temperatures up to 900 C. In addition, it is inert to many aggressive chemicals such as hot concentrated potassium hydroxide (KOH), piranha (H2SO4 + H2O2), and nitric acid (HNO3).

KW - IR-47649

KW - TST-FABRICATION

KW - IOMS-PCS: PHOTONIC CRYSTAL STRUCTURES

KW - EWI-10248

KW - METIS-218304

U2 - 10.1021/nl0350175

DO - 10.1021/nl0350175

M3 - Article

SN - 1530-6984

VL - 4

SP - 283

EP - 287

JO - Nano letters

JF - Nano letters

IS - 2

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