Silicon oxynitride: a versatile material for integrated optics application

Kerstin Worhoff, L.T.H. Hilderink, A. Driessen, Paul Lambeck

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageEnglish
    Title of host publicationSilicon nitride and silicon dioxide thin insulating films
    Subtitle of host publicationproceedings of the sixth international symposium
    EditorsK.B. Sundaram
    PublisherThe Electrochemical Society Inc.
    Pages191-205
    ISBN (Print)1-56677-313-x
    Publication statusPublished - 2001
    Event6th Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films 2001: Electrochemical Society Proceedings - Washington, United States
    Duration: 25 Mar 200130 Mar 2001

    Publication series

    NameProceedings
    PublisherElectrochemical Society
    Volume2001-7

    Conference

    Conference6th Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films 2001
    CountryUnited States
    CityWashington
    Period25/03/0130/03/01

    Keywords

    • METIS-203102

    Cite this

    Worhoff, K., Hilderink, L. T. H., Driessen, A., & Lambeck, P. (2001). Silicon oxynitride: a versatile material for integrated optics application. In K. B. Sundaram (Ed.), Silicon nitride and silicon dioxide thin insulating films: proceedings of the sixth international symposium (pp. 191-205). (Proceedings; Vol. 2001-7). The Electrochemical Society Inc..