Silicon oxynitride: a versatile material for integrated optics application

Kerstin Worhoff; L.T.H. Hilderink; A. Driessen; Paul Lambeck

Silicon oxynitride: a versatile material for integrated optics application

Kerstin Worhoff, L.T.H. Hilderink, A. Driessen, Paul Lambeck

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	English
Title of host publication	Silicon nitride and silicon dioxide thin insulating films
Subtitle of host publication	proceedings of the sixth international symposium
Editors	K.B. Sundaram
Publisher	Electrochemical Society
Pages	191-205
ISBN (Print)	1-56677-313-x
Publication status	Published - 2001
Event	6th Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films 2001: Electrochemical Society Proceedings - Washington, United States Duration: 25 Mar 2001 → 30 Mar 2001

Publication series

Name	Proceedings
Publisher	Electrochemical Society
Volume	2001-7

Conference

Conference	6th Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films 2001
Country/Territory	United States
City	Washington
Period	25/03/01 → 30/03/01

Keywords

METIS-203102

Cite this

@inproceedings{fafbfb5e9d1c4799aa0fe9c00c7cbbe1,

title = "Silicon oxynitride: a versatile material for integrated optics application",

keywords = "METIS-203102",

author = "Kerstin Worhoff and L.T.H. Hilderink and A. Driessen and Paul Lambeck",

year = "2001",

language = "English",

isbn = "1-56677-313-x",

series = "Proceedings",

publisher = "Electrochemical Society",

pages = "191--205",

editor = "K.B. Sundaram",

booktitle = "Silicon nitride and silicon dioxide thin insulating films",

address = "United States",

note = "6th Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films 2001 : Electrochemical Society Proceedings ; Conference date: 25-03-2001 Through 30-03-2001",

}

Worhoff, K, Hilderink, LTH, Driessen, A & Lambeck, P 2001, Silicon oxynitride: a versatile material for integrated optics application. in KB Sundaram (ed.), Silicon nitride and silicon dioxide thin insulating films: proceedings of the sixth international symposium. Proceedings, vol. 2001-7, Electrochemical Society, pp. 191-205, 6th Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films 2001, Washington, District of Columbia, United States, 25/03/01.

Silicon oxynitride: a versatile material for integrated optics application. / Worhoff, Kerstin; Hilderink, L.T.H.; Driessen, A. et al.
Silicon nitride and silicon dioxide thin insulating films: proceedings of the sixth international symposium. ed. / K.B. Sundaram. Electrochemical Society, 2001. p. 191-205 (Proceedings; Vol. 2001-7).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Silicon oxynitride: a versatile material for integrated optics application

AU - Worhoff, Kerstin

AU - Hilderink, L.T.H.

AU - Driessen, A.

AU - Lambeck, Paul

PY - 2001

Y1 - 2001

KW - METIS-203102

M3 - Conference contribution

SN - 1-56677-313-x

T3 - Proceedings

SP - 191

EP - 205

BT - Silicon nitride and silicon dioxide thin insulating films

A2 - Sundaram, K.B.

PB - Electrochemical Society

T2 - 6th Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films 2001

Y2 - 25 March 2001 through 30 March 2001

ER -