Simple technique for direct patterning of nanowires using a nanoslit shadow-mask

D.H. Tong, Henricus V. Jansen, Niels Roelof Tas, V.J. Gadgil, Edwin Carlen, Albert van den Berg

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    2 Citations (Scopus)

    Abstract

    Nanowires of vaious lengths and widths have been fabricated using a wafer-scale shadow mask with deposition windows, or nanoslits, created with focused ion beam machining. Metallic nanowires with widths down to 50 nm and lengths up to 100 micrometers have been realized. Measurements of electrical I-V characteristics show linear behavior of nanowires with widths and thickness each around 50 nm
    Original languageUndefined
    Title of host publicationInternational Solid-State Sensors, Actuators and Microsystems Conference, 2007 (TRANSDUCERS)
    EditorsG. Delapierre, R. Puers
    Place of PublicationNew Jersey
    PublisherIEEE
    Pages191-194
    Number of pages4
    ISBN (Print)1-4244-0842-3
    DOIs
    Publication statusPublished - 10 Jun 2007
    Event14th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS 2007 - Lyon, France
    Duration: 10 Jun 200714 Jun 2007
    Conference number: 14

    Publication series

    NameTRANSDUCERS
    PublisherIEEE
    Volume1

    Conference

    Conference14th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS 2007
    Abbreviated titleTRANSDUCERS 2007
    CountryFrance
    CityLyon
    Period10/06/0714/06/07

    Keywords

    • EWI-11859
    • IR-62152
    • METIS-247690

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