Simple technique for direct patterning of nanowires using a nanoslit shadow-mask

D.H. Tong; Henricus V. Jansen; Niels Roelof Tas; V.J. Gadgil; Edwin Carlen; Albert van den Berg

doi:10.1109/SENSOR.2007.4300103

Simple technique for direct patterning of nanowires using a nanoslit shadow-mask

D.H. Tong, Henricus V. Jansen, Niels Roelof Tas, V.J. Gadgil, Edwin Carlen, Albert van den Berg

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

2 Citations (Scopus)

5 Downloads (Pure)

Abstract

Nanowires of vaious lengths and widths have been fabricated using a wafer-scale shadow mask with deposition windows, or nanoslits, created with focused ion beam machining. Metallic nanowires with widths down to 50 nm and lengths up to 100 micrometers have been realized. Measurements of electrical I-V characteristics show linear behavior of nanowires with widths and thickness each around 50 nm

Original language	Undefined
Title of host publication	International Solid-State Sensors, Actuators and Microsystems Conference, 2007 (TRANSDUCERS)
Editors	G. Delapierre, R. Puers
Place of Publication	New Jersey
Publisher	IEEE
Pages	191-194
Number of pages	4
ISBN (Print)	1-4244-0842-3
DOIs	https://doi.org/10.1109/SENSOR.2007.4300103
Publication status	Published - 10 Jun 2007
Event	14th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS 2007 - Lyon, France Duration: 10 Jun 2007 → 14 Jun 2007 Conference number: 14

Publication series

Name	TRANSDUCERS
Publisher	IEEE
Volume	1

Conference

Conference	14th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS 2007
Abbreviated title	TRANSDUCERS 2007
Country/Territory	France
City	Lyon
Period	10/06/07 → 14/06/07

Keywords

EWI-11859
IR-62152
METIS-247690

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

Access to Document

10.1109/SENSOR.2007.4300103

http://eprints.eemcs.utwente.nl/secure2/11859/01/HienTransducers200704300103.pdf

Cite this

Tong, D. H., Jansen, H. V., Tas, N. R., Gadgil, V. J., Carlen, E., & van den Berg, A. (2007). Simple technique for direct patterning of nanowires using a nanoslit shadow-mask. In G. Delapierre, & R. Puers (Eds.), International Solid-State Sensors, Actuators and Microsystems Conference, 2007 (TRANSDUCERS) (pp. 191-194). Article 10.1109/SENSOR.2007.4300103 (TRANSDUCERS; Vol. 1). IEEE. https://doi.org/10.1109/SENSOR.2007.4300103

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abstract = "Nanowires of vaious lengths and widths have been fabricated using a wafer-scale shadow mask with deposition windows, or nanoslits, created with focused ion beam machining. Metallic nanowires with widths down to 50 nm and lengths up to 100 micrometers have been realized. Measurements of electrical I-V characteristics show linear behavior of nanowires with widths and thickness each around 50 nm",

keywords = "EWI-11859, IR-62152, METIS-247690",

author = "D.H. Tong and Jansen, {Henricus V.} and Tas, {Niels Roelof} and V.J. Gadgil and Edwin Carlen and {van den Berg}, Albert",

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series = "TRANSDUCERS",

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Tong, DH, Jansen, HV, Tas, NR, Gadgil, VJ, Carlen, E & van den Berg, A 2007, Simple technique for direct patterning of nanowires using a nanoslit shadow-mask. in G Delapierre & R Puers (eds), International Solid-State Sensors, Actuators and Microsystems Conference, 2007 (TRANSDUCERS)., 10.1109/SENSOR.2007.4300103, TRANSDUCERS, vol. 1, IEEE, New Jersey, pp. 191-194, 14th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS 2007, Lyon, France, 10/06/07. https://doi.org/10.1109/SENSOR.2007.4300103

Simple technique for direct patterning of nanowires using a nanoslit shadow-mask. / Tong, D.H.; Jansen, Henricus V.; Tas, Niels Roelof et al.
International Solid-State Sensors, Actuators and Microsystems Conference, 2007 (TRANSDUCERS). ed. / G. Delapierre; R. Puers. New Jersey: IEEE, 2007. p. 191-194 10.1109/SENSOR.2007.4300103 (TRANSDUCERS; Vol. 1).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Simple technique for direct patterning of nanowires using a nanoslit shadow-mask

AU - Tong, D.H.

AU - Jansen, Henricus V.

AU - Tas, Niels Roelof

AU - Gadgil, V.J.

AU - Carlen, Edwin

AU - van den Berg, Albert

N1 - Conference code: 14

PY - 2007/6/10

Y1 - 2007/6/10

N2 - Nanowires of vaious lengths and widths have been fabricated using a wafer-scale shadow mask with deposition windows, or nanoslits, created with focused ion beam machining. Metallic nanowires with widths down to 50 nm and lengths up to 100 micrometers have been realized. Measurements of electrical I-V characteristics show linear behavior of nanowires with widths and thickness each around 50 nm

AB - Nanowires of vaious lengths and widths have been fabricated using a wafer-scale shadow mask with deposition windows, or nanoslits, created with focused ion beam machining. Metallic nanowires with widths down to 50 nm and lengths up to 100 micrometers have been realized. Measurements of electrical I-V characteristics show linear behavior of nanowires with widths and thickness each around 50 nm

KW - EWI-11859

KW - IR-62152

KW - METIS-247690

U2 - 10.1109/SENSOR.2007.4300103

DO - 10.1109/SENSOR.2007.4300103

M3 - Conference contribution

SN - 1-4244-0842-3

T3 - TRANSDUCERS

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EP - 194

BT - International Solid-State Sensors, Actuators and Microsystems Conference, 2007 (TRANSDUCERS)

A2 - Delapierre, G.

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PB - IEEE

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T2 - 14th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS 2007

Y2 - 10 June 2007 through 14 June 2007

ER -

Tong DH, Jansen HV, Tas NR, Gadgil VJ, Carlen E, van den Berg A. Simple technique for direct patterning of nanowires using a nanoslit shadow-mask. In Delapierre G, Puers R, editors, International Solid-State Sensors, Actuators and Microsystems Conference, 2007 (TRANSDUCERS). New Jersey: IEEE. 2007. p. 191-194. 10.1109/SENSOR.2007.4300103. (TRANSDUCERS). doi: 10.1109/SENSOR.2007.4300103