Single-shot damage of Ru thin film induced by FEL fs pulses

I. Milov; I.A. Makhotkin; H. Enkisch; R. Sobierajski; J. Chalupsky; K. Tiedtke; Gosse de Vries; F. Scholze; F. Siewert; M. Störmer; R.W.E. van de Kruijs; E.G. Keim; H.A.G.M. van Wolferen; I. Yatsyna; M. Jurek; L. Juha; V. Hajkova; V. Vozda; T. Burian; K. Saksl; B. Faatz; B. Keitel; E. Ploenjes; S. Schreiber; S. Toleikis; R.A. Loch; M. Hermann; S. Strobel; H. Nienhuys; Eric Louis; F. Bijkerk

Single-shot damage of Ru thin film induced by FEL fs pulses

I. Milov, I.A. Makhotkin, H. Enkisch, R. Sobierajski, J. Chalupsky, K. Tiedtke, Gosse de Vries, F. Scholze, F. Siewert, M. Störmer, R.W.E. van de Kruijs, E.G. Keim, H.A.G.M. van Wolferen, I. Yatsyna, M. Jurek, L. Juha, V. Hajkova, V. Vozda, T. Burian, K. SakslB. Faatz, B. Keitel, E. Ploenjes, S. Schreiber, S. Toleikis, R.A. Loch, M. Hermann, S. Strobel, H. Nienhuys, Eric Louis, F. Bijkerk

XUV Optics

Research output: Contribution to conference › Poster › Other research output

Original language	English
Number of pages	1
Publication status	Published - 10 Nov 2016
Event	Low-energy electrons: Lithography, Imaging, and Soft Matter, LEELIS-II workshop 2016 - Amsterdam, Netherlands Duration: 10 Nov 2016 → 11 Nov 2016

Conference

Conference	Low-energy electrons: Lithography, Imaging, and Soft Matter, LEELIS-II workshop 2016
Country/Territory	Netherlands
City	Amsterdam
Period	10/11/16 → 11/11/16

Cite this

Milov, I., Makhotkin, I. A., Enkisch, H., Sobierajski, R., Chalupsky, J., Tiedtke, K., de Vries, G., Scholze, F., Siewert, F., Störmer, M., van de Kruijs, R. W. E., Keim, E. G., van Wolferen, H. A. G. M., Yatsyna, I., Jurek, M., Juha, L., Hajkova, V., Vozda, V., Burian, T., ... Bijkerk, F. (2016). Single-shot damage of Ru thin film induced by FEL fs pulses. Poster session presented at Low-energy electrons: Lithography, Imaging, and Soft Matter, LEELIS-II workshop 2016 , Amsterdam, Netherlands.

@conference{4e81dec9af494ff3bff1c1709d82285f,

title = "Single-shot damage of Ru thin film induced by FEL fs pulses",

author = "I. Milov and I.A. Makhotkin and H. Enkisch and R. Sobierajski and J. Chalupsky and K. Tiedtke and \{de Vries\}, Gosse and F. Scholze and F. Siewert and M. St{\"o}rmer and \{van de Kruijs\}, R.W.E. and E.G. Keim and \{van Wolferen\}, H.A.G.M. and I. Yatsyna and M. Jurek and L. Juha and V. Hajkova and V. Vozda and T. Burian and K. Saksl and B. Faatz and B. Keitel and E. Ploenjes and S. Schreiber and S. Toleikis and R.A. Loch and M. Hermann and S. Strobel and H. Nienhuys and Eric Louis and F. Bijkerk",

year = "2016",

month = nov,

day = "10",

language = "English",

note = "Low-energy electrons: Lithography, Imaging, and Soft Matter, LEELIS-II workshop 2016 ; Conference date: 10-11-2016 Through 11-11-2016",

}

Milov, I, Makhotkin, IA, Enkisch, H, Sobierajski, R, Chalupsky, J, Tiedtke, K, de Vries, G, Scholze, F, Siewert, F, Störmer, M, van de Kruijs, RWE, Keim, EG, van Wolferen, HAGM, Yatsyna, I, Jurek, M, Juha, L, Hajkova, V, Vozda, V, Burian, T, Saksl, K, Faatz, B, Keitel, B, Ploenjes, E, Schreiber, S, Toleikis, S, Loch, RA, Hermann, M, Strobel, S, Nienhuys, H, Louis, E & Bijkerk, F 2016, 'Single-shot damage of Ru thin film induced by FEL fs pulses', Low-energy electrons: Lithography, Imaging, and Soft Matter, LEELIS-II workshop 2016 , Amsterdam, Netherlands, 10/11/16 - 11/11/16.

TY - CONF

T1 - Single-shot damage of Ru thin film induced by FEL fs pulses

AU - Milov, I.

AU - Makhotkin, I.A.

AU - Enkisch, H.

AU - Sobierajski, R.

AU - Chalupsky, J.

AU - Tiedtke, K.

AU - de Vries, Gosse

AU - Scholze, F.

AU - Siewert, F.

AU - Störmer, M.

AU - van de Kruijs, R.W.E.

AU - Keim, E.G.

AU - van Wolferen, H.A.G.M.

AU - Yatsyna, I.

AU - Jurek, M.

AU - Juha, L.

AU - Hajkova, V.

AU - Vozda, V.

AU - Burian, T.

AU - Saksl, K.

AU - Faatz, B.

AU - Keitel, B.

AU - Ploenjes, E.

AU - Schreiber, S.

AU - Toleikis, S.

AU - Loch, R.A.

AU - Hermann, M.

AU - Strobel, S.

AU - Nienhuys, H.

AU - Louis, Eric

AU - Bijkerk, F.

PY - 2016/11/10

Y1 - 2016/11/10

M3 - Poster

T2 - Low-energy electrons: Lithography, Imaging, and Soft Matter, LEELIS-II workshop 2016

Y2 - 10 November 2016 through 11 November 2016

ER -