Single-step patterning on inclined surfaces with ensured alignment for 3D nanofabrication

Research output: Contribution to conferencePosterOther research output

Original languageEnglish
Pages-
Publication statusPublished - 21 Feb 2016
EventSPIE Advanced Lithography 2016 - San Jose Marriott and San Jose Convention Center, San Jose, United States
Duration: 21 Feb 201625 Feb 2016

Conference

ConferenceSPIE Advanced Lithography 2016
CountryUnited States
CitySan Jose
Period21/02/1625/02/16

Keywords

  • METIS-319621

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