Single-step patterning on inclined surfaces with ensured alignment for 3D nanofabrication

Research output: Contribution to conference › Poster › Other research output

Original language	English
Pages	-
Publication status	Published - 21 Feb 2016
Event	SPIE Advanced Lithography 2016 - San Jose Marriott and San Jose Convention Center, San Jose, United States Duration: 21 Feb 2016 → 25 Feb 2016

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@conference{7bd3683d2d5b4178807aeee6e38dcba0,

title = "Single-step patterning on inclined surfaces with ensured alignment for 3D nanofabrication",

keywords = "METIS-319621",

author = "Diana Grishina and Harteveld, \{Cornelis A.M.\} and L.A. Woldering and Vos, \{Willem L.\}",

year = "2016",

month = feb,

day = "21",

language = "English",

pages = "--",

note = "SPIE Advanced Lithography 2016 ; Conference date: 21-02-2016 Through 25-02-2016",

}