Abstract
In this work we present the smoothing properties of our ion beam smoothened multilayers and, based on the same technology, the extreme smoothing properties in the high and near mid spatial frequency range of a single-material smoothing layer. Coating results of high reflectance multilayers both on rough substrates and on substrates smoothened with silicon bufferlayers are discussed.
Original language | English |
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Title of host publication | Emerging Lithographic Technologies XII |
DOIs | |
Publication status | Published - 1 Dec 2008 |
Event | Emerging Lithographic Technologies XII 2008 - San Jose, United States Duration: 26 Feb 2008 → 28 Feb 2008 Conference number: 12 |
Publication series
Name | Proceedings of SPIE - The International Society for Optical Engineering |
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Volume | 6921 |
ISSN (Print) | 0277-786X |
Conference
Conference | Emerging Lithographic Technologies XII 2008 |
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Country/Territory | United States |
City | San Jose |
Period | 26/02/08 → 28/02/08 |
Keywords
- EUV lithography
- Mo/si multilayers
- Roughness
- Smoothening