Smoothing properties of single- and multilayer coatings, a method to smoothen substrates

A. J R Van Den Boogaard; E. Louis; E. Zoethout; S. Alonso Van Der Westen; F. Bijkerk; S. Müllender

doi:10.1117/12.772479

Smoothing properties of single- and multilayer coatings, a method to smoothen substrates

A. J R Van Den Boogaard, E. Louis, E. Zoethout, S. Alonso Van Der Westen, F. Bijkerk, S. Müllender

XUV Optics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

3 Citations (Scopus)

Abstract

In this work we present the smoothing properties of our ion beam smoothened multilayers and, based on the same technology, the extreme smoothing properties in the high and near mid spatial frequency range of a single-material smoothing layer. Coating results of high reflectance multilayers both on rough substrates and on substrates smoothened with silicon bufferlayers are discussed.

Original language	English
Title of host publication	Emerging Lithographic Technologies XII
DOIs	https://doi.org/10.1117/12.772479
Publication status	Published - 1 Dec 2008
Event	Emerging Lithographic Technologies XII 2008 - San Jose, United States Duration: 26 Feb 2008 → 28 Feb 2008 Conference number: 12

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	6921
ISSN (Print)	0277-786X

Conference

Conference	Emerging Lithographic Technologies XII 2008
Country/Territory	United States
City	San Jose
Period	26/02/08 → 28/02/08

Keywords

EUV lithography
Mo/si multilayers
Roughness
Smoothening

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10.1117/12.772479

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Van Den Boogaard, A. J. R., Louis, E., Zoethout, E., Van Der Westen, S. A., Bijkerk, F., & Müllender, S. (2008). Smoothing properties of single- and multilayer coatings, a method to smoothen substrates. In Emerging Lithographic Technologies XII Article 69210R (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6921). https://doi.org/10.1117/12.772479

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title = "Smoothing properties of single- and multilayer coatings, a method to smoothen substrates",

abstract = "In this work we present the smoothing properties of our ion beam smoothened multilayers and, based on the same technology, the extreme smoothing properties in the high and near mid spatial frequency range of a single-material smoothing layer. Coating results of high reflectance multilayers both on rough substrates and on substrates smoothened with silicon bufferlayers are discussed.",

keywords = "EUV lithography, Mo/si multilayers, Roughness, Smoothening",

author = "{Van Den Boogaard}, {A. J R} and E. Louis and E. Zoethout and {Van Der Westen}, {S. Alonso} and F. Bijkerk and S. M{\"u}llender",

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language = "English",

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Van Den Boogaard, AJR, Louis, E, Zoethout, E, Van Der Westen, SA, Bijkerk, F & Müllender, S 2008, Smoothing properties of single- and multilayer coatings, a method to smoothen substrates. in Emerging Lithographic Technologies XII., 69210R, Proceedings of SPIE - The International Society for Optical Engineering, vol. 6921, Emerging Lithographic Technologies XII 2008, San Jose, California, United States, 26/02/08. https://doi.org/10.1117/12.772479

Smoothing properties of single- and multilayer coatings, a method to smoothen substrates. / Van Den Boogaard, A. J R; Louis, E.; Zoethout, E. et al.
Emerging Lithographic Technologies XII. 2008. 69210R (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6921).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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T1 - Smoothing properties of single- and multilayer coatings, a method to smoothen substrates

AU - Van Den Boogaard, A. J R

AU - Louis, E.

AU - Zoethout, E.

AU - Van Der Westen, S. Alonso

AU - Bijkerk, F.

AU - Müllender, S.

N1 - Conference code: 12

PY - 2008/12/1

Y1 - 2008/12/1

N2 - In this work we present the smoothing properties of our ion beam smoothened multilayers and, based on the same technology, the extreme smoothing properties in the high and near mid spatial frequency range of a single-material smoothing layer. Coating results of high reflectance multilayers both on rough substrates and on substrates smoothened with silicon bufferlayers are discussed.

AB - In this work we present the smoothing properties of our ion beam smoothened multilayers and, based on the same technology, the extreme smoothing properties in the high and near mid spatial frequency range of a single-material smoothing layer. Coating results of high reflectance multilayers both on rough substrates and on substrates smoothened with silicon bufferlayers are discussed.

KW - EUV lithography

KW - Mo/si multilayers

KW - Roughness

KW - Smoothening

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U2 - 10.1117/12.772479

DO - 10.1117/12.772479

M3 - Conference contribution

AN - SCOPUS:67149084743

SN - 9780819471062

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Emerging Lithographic Technologies XII

T2 - Emerging Lithographic Technologies XII 2008

Y2 - 26 February 2008 through 28 February 2008

ER -

Smoothing properties of single- and multilayer coatings, a method to smoothen substrates

Abstract

Publication series

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Keywords

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