Smoothing properties of single- and multilayer coatings, a method to smoothen substrates

A. J R Van Den Boogaard, E. Louis, E. Zoethout, S. Alonso Van Der Westen, F. Bijkerk, S. Müllender

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

3 Citations (Scopus)

Abstract

In this work we present the smoothing properties of our ion beam smoothened multilayers and, based on the same technology, the extreme smoothing properties in the high and near mid spatial frequency range of a single-material smoothing layer. Coating results of high reflectance multilayers both on rough substrates and on substrates smoothened with silicon bufferlayers are discussed.

Original languageEnglish
Title of host publicationEmerging Lithographic Technologies XII
DOIs
Publication statusPublished - 1 Dec 2008
EventEmerging Lithographic Technologies XII 2008 - San Jose, United States
Duration: 26 Feb 200828 Feb 2008
Conference number: 12

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6921
ISSN (Print)0277-786X

Conference

ConferenceEmerging Lithographic Technologies XII 2008
CountryUnited States
CitySan Jose
Period26/02/0828/02/08

Keywords

  • EUV lithography
  • Mo/si multilayers
  • Roughness
  • Smoothening

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  • Cite this

    Van Den Boogaard, A. J. R., Louis, E., Zoethout, E., Van Der Westen, S. A., Bijkerk, F., & Müllender, S. (2008). Smoothing properties of single- and multilayer coatings, a method to smoothen substrates. In Emerging Lithographic Technologies XII [69210R] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6921). https://doi.org/10.1117/12.772479