Abstract
This work quantitatively compares breakdown triggers for constant voltage stress of large area NMOS capacitors (up to 10 mm2) with 1.8 to 12 nm gate oxide thickness (with negative VG). We conclude that in the studied range, breakdown is identified more reliably with a current step trigger than through increased current fluctuation (RMS). We also present data filtering algorithms that significantly enhance the ratio between the breakdown signal and background noise level.
Original language | English |
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Title of host publication | 39th IEEE International Reliability Physics Symposium 2001 |
Subtitle of host publication | Orlando, Florida, April 30-May 3, 2001 |
Publisher | IEEE |
Pages | 393-398 |
Number of pages | 6 |
ISBN (Print) | 0-7803-6587-9, 0-7803-6589-5 |
DOIs | |
Publication status | Published - 1 Jan 2001 |
Externally published | Yes |
Event | 39th Annual IEEE International Reliability Physics Symposium, IRPS 2001 - Orlando, United States Duration: 30 Apr 2001 → 3 May 2001 Conference number: 39 |
Conference
Conference | 39th Annual IEEE International Reliability Physics Symposium, IRPS 2001 |
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Abbreviated title | IRPS 2001 |
Country/Territory | United States |
City | Orlando |
Period | 30/04/01 → 3/05/01 |
Keywords
- Breakdown voltage
- Capacitors
- Carbon capture and storage
- Dielectric breakdown
- Electric breakdown
- Laboratories
- MOS devices
- Stress
- Testing
- Time measurement