Spectral line competition in a coaxial e-beam pumped high pressure Ar/Xe laser

Y.F. Lan; Y.F. Lan; P.J.M. Peters; W.J. Witteman

doi:10.1007/BF00325492

Spectral line competition in a coaxial e-beam pumped high pressure Ar/Xe laser

Y.F. Lan, Y.F. Lan, P.J.M. Peters, W.J. Witteman

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Abstract

In order to study the kinetic mechanism of the e-beam pumped Ar/Xe laser, the temporal profiles of individual laser lines during multiline oscillation have been measured as a function of power deposition (1–12MW/cm3) and gas laser pressure (2–14 bar) using a short pulse (30 ns) coaxial electron beam as excitation source. It was found that the optimum output energy at each pressure was obtained at the same specific power deposition. Strong line competition has been observed between the 2.65 and 1.73 μm transitions. In order to explain our results we suggest that besides electron collision mixing (ECM) between the 5d and 6p levels of Xe, there is also a redistribution between all 6p levels which strongly favours the lower levels at higher pumping densities.

Original language	English
Pages (from-to)	336-340
Number of pages	5
Journal	Applied physics B: Photophysics and laser chemistry
Volume	52
Issue number	5
DOIs	https://doi.org/10.1007/BF00325492
Publication status	Published - 1991

Keywords

METIS-129663
IR-85901

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10.1007/BF00325492

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title = "Spectral line competition in a coaxial e-beam pumped high pressure Ar/Xe laser",

abstract = "In order to study the kinetic mechanism of the e-beam pumped Ar/Xe laser, the temporal profiles of individual laser lines during multiline oscillation have been measured as a function of power deposition (1–12MW/cm3) and gas laser pressure (2–14 bar) using a short pulse (30 ns) coaxial electron beam as excitation source. It was found that the optimum output energy at each pressure was obtained at the same specific power deposition. Strong line competition has been observed between the 2.65 and 1.73 μm transitions. In order to explain our results we suggest that besides electron collision mixing (ECM) between the 5d and 6p levels of Xe, there is also a redistribution between all 6p levels which strongly favours the lower levels at higher pumping densities.",

keywords = "METIS-129663, IR-85901",

author = "Y.F. Lan and Y.F. Lan and P.J.M. Peters and W.J. Witteman",

year = "1991",

doi = "10.1007/BF00325492",

language = "English",

volume = "52",

pages = "336--340",

journal = "Applied physics B: Photophysics and laser chemistry",

issn = "0721-7269",

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TY - JOUR

T1 - Spectral line competition in a coaxial e-beam pumped high pressure Ar/Xe laser

AU - Lan, Y.F.

AU - Peters, P.J.M.

AU - Witteman, W.J.

PY - 1991

Y1 - 1991

N2 - In order to study the kinetic mechanism of the e-beam pumped Ar/Xe laser, the temporal profiles of individual laser lines during multiline oscillation have been measured as a function of power deposition (1–12MW/cm3) and gas laser pressure (2–14 bar) using a short pulse (30 ns) coaxial electron beam as excitation source. It was found that the optimum output energy at each pressure was obtained at the same specific power deposition. Strong line competition has been observed between the 2.65 and 1.73 μm transitions. In order to explain our results we suggest that besides electron collision mixing (ECM) between the 5d and 6p levels of Xe, there is also a redistribution between all 6p levels which strongly favours the lower levels at higher pumping densities.

AB - In order to study the kinetic mechanism of the e-beam pumped Ar/Xe laser, the temporal profiles of individual laser lines during multiline oscillation have been measured as a function of power deposition (1–12MW/cm3) and gas laser pressure (2–14 bar) using a short pulse (30 ns) coaxial electron beam as excitation source. It was found that the optimum output energy at each pressure was obtained at the same specific power deposition. Strong line competition has been observed between the 2.65 and 1.73 μm transitions. In order to explain our results we suggest that besides electron collision mixing (ECM) between the 5d and 6p levels of Xe, there is also a redistribution between all 6p levels which strongly favours the lower levels at higher pumping densities.

KW - METIS-129663

KW - IR-85901

U2 - 10.1007/BF00325492

DO - 10.1007/BF00325492

M3 - Article

SN - 0721-7269

VL - 52

SP - 336

EP - 340

JO - Applied physics B: Photophysics and laser chemistry

JF - Applied physics B: Photophysics and laser chemistry

IS - 5

ER -

Spectral line competition in a coaxial e-beam pumped high pressure Ar/Xe laser

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Keywords

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