Abstract
In order to study the kinetic mechanism of the e-beam pumped Ar/Xe laser, the temporal profiles of individual laser lines during multiline oscillation have been measured as a function of power deposition (1–12MW/cm3) and gas laser pressure (2–14 bar) using a short pulse (30 ns) coaxial electron beam as excitation source. It was found that the optimum output energy at each pressure was obtained at the same specific power deposition.
Strong line competition has been observed between the 2.65 and 1.73 μm transitions. In order to explain our results we suggest that besides electron collision mixing (ECM) between the 5d and 6p levels of Xe, there is also a redistribution between all 6p levels which strongly favours the lower levels at higher pumping densities.
| Original language | English |
|---|---|
| Pages (from-to) | 336-340 |
| Number of pages | 5 |
| Journal | Applied physics B: Photophysics and laser chemistry |
| Volume | 52 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - 1991 |
Keywords
- METIS-129663
- IR-85901
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Lan, Y. F., Lan, Y. F., Peters, P. J. M., & Witteman, W. J. (1991). Spectral line competition in a coaxial e-beam pumped high pressure Ar/Xe laser. Applied physics B: Photophysics and laser chemistry, 52(5), 336-340. https://doi.org/10.1007/BF00325492