Spectral purity enhancement for the EUV Lithography Systems by suppressing UV reflection from multilayers

Qiushi Huang, Meint de Boer, Jonathan Barreaux, Daniel Mathijs Paardekooper, Toine van den Boogaard, Robbert van de Kruijs, Erwin Zoethout, Eric Louis, Fred Bijkerk

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

2 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Spectral purity enhancement for the EUV Lithography Systems by suppressing UV reflection from multilayers'. Together they form a unique fingerprint.

Physics & Astronomy