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Spectral purity enhancement for the EUV Lithography Systems by suppressing UV reflection from multilayers
Qiushi Huang, Meint de Boer, Jonathan Barreaux, Daniel Mathijs Paardekooper, Toine van den Boogaard, Robbert van de Kruijs, Erwin Zoethout, Eric Louis, Fred Bijkerk
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review
2
Citations
(Scopus)