Spectral-purity-enhancing layer for multilayer mirrors

M. M.J.W. Van Herpen, R. W.E. Van De Kruijs, D. J.W. Klunder, E. Louis, A. E. Yakshin, S. Alonso Van Der Westen, F. Bijkerk, V. Banine

Research output: Contribution to journalArticleAcademicpeer-review

24 Citations (Scopus)

Abstract

We demonstrate, both theoretically and experimentally, that special spectral-purity-enhancing multilayer mirror systems can be designed and fabricated to substantially reduce the level of out-of-band radiation expected in an extreme ultraviolet lithographic tool. A first proof of principle of applying such spectral-purityenhancement layers showed reduced out-of-band reflectance by a factor of five, while the in-band reflectance is only 4.5% (absolute) less than for a standard capped multilayer.

Original languageEnglish
Pages (from-to)560-562
Number of pages3
JournalOptics letters
Volume33
Issue number6
DOIs
Publication statusPublished - 15 Mar 2008

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