Spectral purity performance of high-power EUV systems

Mark van de Kerkhof; Fei Liu; Marieke Meeuwissen; Xueqing Zhang; Robert de Kruif; Natalia Davydova; Guido Schiffelers; Felix Wählish; Eelco van Setten; Wouter Varenkamp; Kees Ricken; Laurens de Winter; John McNamara; Muharrem  Bayraktar

doi:10.1117/12.2551021

Spectral purity performance of high-power EUV systems

Mark van de Kerkhof, Fei Liu, Marieke Meeuwissen, Xueqing Zhang, Robert de Kruif, Natalia Davydova, Guido Schiffelers, Felix Wählish, Eelco van Setten, Wouter Varenkamp, Kees Ricken, Laurens de Winter, John McNamara, Muharrem Bayraktar

XUV Optics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

8 Citations (Scopus)

488 Downloads (Pure)

Abstract

With the introduction of the NXE:3400B scanner, ASML has brought EUV to High-Volume Manufacturing (HVM). The high EUV power of >200W being realized with this system satisfies the throughput requirements of HVM, but also requires reconsideration of the imaging aspects of spectral purity, both from the details of the EUV emission spectrum and from the DUV emission. This paper will present simulation and experimental results for the spectral purity of high-power EUV systems, and the imaging impact of this, both for the case of with and without a pellicle. Also, possible controls for spectral purity will be discussed, and a novel method will be described to measure imaging impact of varying CE and DUV. It will be shown that CE optimization towards higher source power leads to reduction in relative DUV content, that the small deltas in EUV source spectrum for higher power do not influence imaging. It will also be shown that resulting variations in DUV do not affect imaging performance significantly, provided that a suitable reticle black border is used. In short, spectral purity performance is not a bottleneck for increasing power of EUV systems to well above 250W.

Original language	English
Title of host publication	Extreme Ultraviolet (EUV) Lithography XI
Editors	Nelson M. Felix, Anna Lio
Publisher	SPIE
Number of pages	16
Volume	11323
ISBN (Electronic)	9781510634145
ISBN (Print)	9781510634138
DOIs	https://doi.org/10.1117/12.2551021
Publication status	Published - 23 Mar 2020
Event	SPIE Advanced Litography 2020 - San Jose Convention Center, San Jose, United States Duration: 23 Feb 2020 → 27 Feb 2020

Publication series

Name	SPIE Conference Proceedings
Publisher	SPIE
Volume	1323
ISSN (Print)	0277-786X

Conference

Conference	SPIE Advanced Litography 2020
Country/Territory	United States
City	San Jose
Period	23/02/20 → 27/02/20

Keywords

DGL-membrane
DUV
EUV
High-Power
Pellicle
Spectral Purity

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

Access to Document

10.1117/12.2551021

spie_2020_1132321Final published version, 1.44 MB

Cite this

van de Kerkhof, M., Liu, F., Meeuwissen, M., Zhang, X., de Kruif, R., Davydova, N., Schiffelers, G., Wählish, F., van Setten, E., Varenkamp, W., Ricken, K., de Winter, L., McNamara, J., & Bayraktar, M. (2020). Spectral purity performance of high-power EUV systems. In N. M. Felix, & A. Lio (Eds.), Extreme Ultraviolet (EUV) Lithography XI (Vol. 11323). Article 1132321 (SPIE Conference Proceedings; Vol. 1323). SPIE. https://doi.org/10.1117/12.2551021

@inproceedings{b02630ef655f4ab5a1057a9179bbedc0,

title = "Spectral purity performance of high-power EUV systems",

abstract = "With the introduction of the NXE:3400B scanner, ASML has brought EUV to High-Volume Manufacturing (HVM). The high EUV power of >200W being realized with this system satisfies the throughput requirements of HVM, but also requires reconsideration of the imaging aspects of spectral purity, both from the details of the EUV emission spectrum and from the DUV emission. This paper will present simulation and experimental results for the spectral purity of high-power EUV systems, and the imaging impact of this, both for the case of with and without a pellicle. Also, possible controls for spectral purity will be discussed, and a novel method will be described to measure imaging impact of varying CE and DUV. It will be shown that CE optimization towards higher source power leads to reduction in relative DUV content, that the small deltas in EUV source spectrum for higher power do not influence imaging. It will also be shown that resulting variations in DUV do not affect imaging performance significantly, provided that a suitable reticle black border is used. In short, spectral purity performance is not a bottleneck for increasing power of EUV systems to well above 250W.",

keywords = "DGL-membrane, DUV, EUV, High-Power, Pellicle, Spectral Purity",

author = "{van de Kerkhof}, Mark and Fei Liu and Marieke Meeuwissen and Xueqing Zhang and {de Kruif}, Robert and Natalia Davydova and Guido Schiffelers and Felix W{\"a}hlish and {van Setten}, Eelco and Wouter Varenkamp and Kees Ricken and {de Winter}, Laurens and John McNamara and Muharrem Bayraktar",

year = "2020",

month = mar,

day = "23",

doi = "10.1117/12.2551021",

language = "English",

isbn = "9781510634138",

volume = "11323",

series = "SPIE Conference Proceedings",

publisher = "SPIE",

editor = "Felix, {Nelson M.} and Anna Lio",

booktitle = "Extreme Ultraviolet (EUV) Lithography XI",

address = "United States",

note = "SPIE Advanced Litography 2020 ; Conference date: 23-02-2020 Through 27-02-2020",

}

van de Kerkhof, M, Liu, F, Meeuwissen, M, Zhang, X, de Kruif, R, Davydova, N, Schiffelers, G, Wählish, F, van Setten, E, Varenkamp, W, Ricken, K, de Winter, L, McNamara, J & Bayraktar, M 2020, Spectral purity performance of high-power EUV systems. in NM Felix & A Lio (eds), Extreme Ultraviolet (EUV) Lithography XI. vol. 11323, 1132321, SPIE Conference Proceedings, vol. 1323, SPIE, SPIE Advanced Litography 2020, San Jose, California, United States, 23/02/20. https://doi.org/10.1117/12.2551021

Spectral purity performance of high-power EUV systems. / van de Kerkhof, Mark; Liu, Fei; Meeuwissen, Marieke et al.
Extreme Ultraviolet (EUV) Lithography XI. ed. / Nelson M. Felix; Anna Lio. Vol. 11323 SPIE, 2020. 1132321 (SPIE Conference Proceedings; Vol. 1323).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Spectral purity performance of high-power EUV systems

AU - van de Kerkhof, Mark

AU - Liu, Fei

AU - Meeuwissen, Marieke

AU - Zhang, Xueqing

AU - de Kruif, Robert

AU - Davydova, Natalia

AU - Schiffelers, Guido

AU - Wählish, Felix

AU - van Setten, Eelco

AU - Varenkamp, Wouter

AU - Ricken, Kees

AU - de Winter, Laurens

AU - McNamara, John

AU - Bayraktar, Muharrem

PY - 2020/3/23

Y1 - 2020/3/23

N2 - With the introduction of the NXE:3400B scanner, ASML has brought EUV to High-Volume Manufacturing (HVM). The high EUV power of >200W being realized with this system satisfies the throughput requirements of HVM, but also requires reconsideration of the imaging aspects of spectral purity, both from the details of the EUV emission spectrum and from the DUV emission. This paper will present simulation and experimental results for the spectral purity of high-power EUV systems, and the imaging impact of this, both for the case of with and without a pellicle. Also, possible controls for spectral purity will be discussed, and a novel method will be described to measure imaging impact of varying CE and DUV. It will be shown that CE optimization towards higher source power leads to reduction in relative DUV content, that the small deltas in EUV source spectrum for higher power do not influence imaging. It will also be shown that resulting variations in DUV do not affect imaging performance significantly, provided that a suitable reticle black border is used. In short, spectral purity performance is not a bottleneck for increasing power of EUV systems to well above 250W.

AB - With the introduction of the NXE:3400B scanner, ASML has brought EUV to High-Volume Manufacturing (HVM). The high EUV power of >200W being realized with this system satisfies the throughput requirements of HVM, but also requires reconsideration of the imaging aspects of spectral purity, both from the details of the EUV emission spectrum and from the DUV emission. This paper will present simulation and experimental results for the spectral purity of high-power EUV systems, and the imaging impact of this, both for the case of with and without a pellicle. Also, possible controls for spectral purity will be discussed, and a novel method will be described to measure imaging impact of varying CE and DUV. It will be shown that CE optimization towards higher source power leads to reduction in relative DUV content, that the small deltas in EUV source spectrum for higher power do not influence imaging. It will also be shown that resulting variations in DUV do not affect imaging performance significantly, provided that a suitable reticle black border is used. In short, spectral purity performance is not a bottleneck for increasing power of EUV systems to well above 250W.

KW - DGL-membrane

KW - DUV

KW - EUV

KW - High-Power

KW - Pellicle

KW - Spectral Purity

UR - http://www.scopus.com/inward/record.url?scp=85084174824&partnerID=8YFLogxK

U2 - 10.1117/12.2551021

DO - 10.1117/12.2551021

M3 - Conference contribution

SN - 9781510634138

VL - 11323

T3 - SPIE Conference Proceedings

BT - Extreme Ultraviolet (EUV) Lithography XI

A2 - Felix, Nelson M.

A2 - Lio, Anna

PB - SPIE

T2 - SPIE Advanced Litography 2020

Y2 - 23 February 2020 through 27 February 2020

ER -

Spectral purity performance of high-power EUV systems

Abstract

Publication series

Conference

Keywords

UN SDGs

Access to Document

Other files and links

Fingerprint

High-power EUV lithography: spectral purity and imaging performance

Cite this